Synthesis and characterization of Al2 O3 and Si O2 films with fluoropolymer content using rf-plasma magnetron sputtering technique

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 26, Issue 2, 2008, Pages 198-204

  Islam, Mohammad ^a   Inal, Osman T ^b  

^a NATIONAL UNIVERSITY OF SCIENCES AND TECHNOLOGY   (Pakistan)

^b NEW MEXICO INSTITUTE OF MINING AND TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHAMBER PRESSURE; INORGANIC FILMS;

AEROSPACE APPLICATIONS; ALUMINUM COMPOUNDS; FLUORINE CONTAINING POLYMERS; GRAIN SIZE AND SHAPE; MAGNETRON SPUTTERING; PLASMA POLYMERIZATION;

OXIDE FILMS;

EID: 40249097754     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2831503     Document Type: Article

References (26)