Influence of inert gas species on the growth of silver and molybdenum films via a magnetron discharge

Surface and Coatings Technology

Volumn 206, Issue 7, 2011, Pages 1648-1652

  West, G T ^a   Kelly, P J ^a  

^a MANCHESTER METROPOLITAN UNIVERSITY   (United Kingdom)

Author keywords

Inert gases; Magnetron sputtering; Molybdenum; Silver

Indexed keywords

ATOMIC MASS; DEPOSITED COATINGS; DEPOSITED FILMS; ELECTRICAL CHARACTERISTIC; GAS SPECIES; LOW COSTS; MAGNETRON DISCHARGES; MID-FREQUENCY; MOLYBDENUM FILMS; OPTICAL AND ELECTRICAL PROPERTIES; PARTICLE IMPLANTATION; PLASMA DISCHARGE; PROCESS GAS; PULSED DC; SOLID SURFACE; SPUTTER YIELDS; SPUTTERING DEPOSITION; TARGET MATERIALS; THIN METALLIC FILMS;

ARGON; ECOLOGY; ELECTRIC DISCHARGES; ELECTRIC PROPERTIES; GASES; INERT GASES; ION BOMBARDMENT; KRYPTON; MAGNETRON SPUTTERING; MECHANICAL PROPERTIES; MOLYBDENUM; NEON; PLASMAS; SILVER; SPUTTERING;

XENON;

EID: 82755189426     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2011.08.025     Document Type: Article

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