Fabrication of silicon nanostructures using metal-assisted etching in NaBF4

Physica Status Solidi (A) Applications and Materials Science

Volumn 210, Issue 10, 2013, Pages 2178-2182

  Nguyen, Nhung T P ^a,b   Coffinier, Yannick ^a   Thomy, Vincent ^b   Boukherroub, Rabah ^a  

^a CNRS   (France)

^b INSTITUT D ELECTRONIQUE   (France)

Author keywords

metal assisted etching; nanostructures; silicon; sodium tetrafluoroborate

Indexed keywords

ETCHING PARAMETERS; NANO-STRUCTURED LAYER; REACTANT CONCENTRATIONS; REFLECTIVITY MEASUREMENTS; SILICON NANO STRUCTURES; SILVER NITRATES; SUBSTRATE ORIENTATION; TETRAFLUOROBORATES;

ETCHING; SCANNING ELECTRON MICROSCOPY; SILICON; SODIUM;

NANOSTRUCTURES;

EID: 84886100784     PISSN: 18626300     EISSN: 18626319     Source Type: Journal    
DOI: 10.1002/pssa.201330035     Document Type: Article

References (11)

1. K. W. Kolasinski, Surf. Sci. 603, 1904 (2009).
2. K. W. Kolasinski, Curr. Opin. Solid State Mater. Sci. 9, 73 (2005).
3. Z. Huang, N. Geyer, P. Werner, J. de Boor, and, U. Gösele, Adv. Mater. 23, 285 (2011).
4. W. Ye, C. Shen, J. Tian, C. Wang, L. Bao, and, H. Gao, Electrochem. Commun. 10, 625 (2008).
5. N. Brahiti, S. Bouanik, and, T. Hadjersi, Appl. Surf. Sci. 258, 5628 (2012).
6. M. L. Zhang, K. Q. Peng, X. Fan, J. S. Jie, R. Q. Zhang, S. T. Lee, and, N. B. Wong, J. Phys. Chem. C 112, 4444 (2008).
7. K. Peng, Y. Wu, H. Fang, X. Zhong, Y. Xu, and, J. Zhu, Angew. Chem., Int. Ed. 44, 2737 (2005).
8. G. Piret, H. Drobeq, Y. Coffinier, O. Melnyk, and, R. Boukherroub, Langmuir 26, 1354 (2010).
9. K. Peng, H. Fang, J. Hu, Y. Hu, J. Zhu, Y. Yan, and, S. Lee, Chem. Eur. J. 12, 7942 (2006).
10. N. Megouda, T. Hadjersi, G. Piret, R. Boukherroub, and, O. Elkechai, Appl. Surf. Sci. 255, 6210 (2009).
11. Y. H. Ogata, K. Kobayashi, and, M. Motoyama, Curr. Opin. Solid State Mater. Sci. 10, 163 (2006).