An influence of deposition temperature on structural, optical and electrical properties of sprayed ZnO thin films of identical thickness

Current Applied Physics

Volumn 13, Issue 9, 2013, Pages 2109-2116

  Mahajan, C M ^a,b   Takwale, M G ^b  

^a VISHWAKARMA INSTITUTE OF TECHNOLOGY   (India)

^b UNIVERSITY OF PUNE   (India)

Author keywords

Desorption; Electrical; Optical properties; Structural; Wettability; ZnO thin films

Indexed keywords

C-AXIS ORIENTATIONS; DEPOSITION TEMPERATURES; ELECTRICAL; INTERMITTENT SPRAY PYROLYSIS; OPTICAL AND ELECTRICAL PROPERTIES; SCANNING ELECTRON MICROSCOPIC; STRUCTURAL; ZNO THIN FILM;

DESORPTION; GRAIN BOUNDARIES; METALLIC FILMS; NANORODS; OPTICAL FILMS; OPTICAL PROPERTIES; POLYCRYSTALLINE MATERIALS; SCANNING ELECTRON MICROSCOPY; SPRAY PYROLYSIS; WETTING; X RAY DIFFRACTION ANALYSIS; ZINC SULFIDE;

ELECTRIC PROPERTIES;

EID: 84886014738     PISSN: 15671739     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.cap.2013.09.004     Document Type: Article

References (54)

1. F. Paraguay D., W. Estrada L., D.R. Acosta N., E. Andrade, and M. Miki-Yoshida Thin Solid Films 350 1999 192 202
2. D.J. Goyal, C. Agashe, M.G. Takwale, B.R. Marathe, and V.G. Bhide J. Mater. Sci. 27 1992 4705
3. D.C. Look Mater. Sci. Eng. B Solid-State Mater. Adv. Technol. 80 2001 383
4. S.O. Kucheyev, J.S. Williams, C. Jagadish, J. Zou, C. Evans, A.J. Nelson, and A.V. Hamza Phys. Rev. B 67 2003 094115
5. A. Ashour, M.A. Kaid, N.Z. El-Sayed, and A.A. Ibrahim Appl. Surf. Sci. 252 2006 7844 7848
6. M.T. Mohammad, A.A. Hashim, and M.H. Al-Maamory Mater. Chem. Phy. 99 2006 382 387
7. G. Hua, Y. Zhang, J. Zhang, X. Cao, W. Xu, and L. Zhang Mater. Lett. 62 2008 4109 4111
8. D.A. Lamb, and S.J.C. Irvine J. Cryst. Growth 273 2004 111
9. Z.W. Pan, Z.R. Dai, and Z.L. Wang Science 291 2001 1947
10. B.Y. Oh, M.C. Jeong, T.H. Moon, W. Lee, J.M. Myoung, J.Y. Hwang, and D.S. Seo J. Appl. Phys. 99 2006 124505
11. H.T. Wang, B.S. Kang, F. Ren, L.C. Tien, P.W. Sadik, D.P. Norton, S.J. Pearton, and Jenshan Lin Appl. Phys. Lett. 86 2005 243503
12. L.C. Tien, P.W. Sadik, D.P. Norton, L.F. Voss, S.J. Pearton, H.T. Wang, B.S. Kang, F. Ren, J. Jun, and J. Lin Appl. Phys. Lett. 87 2005 222106
13. V.R. Shinde, T.P. Gujar, and C.D. Lokhande Sens. Actuators B 120 2007 551 559
14. Y.C. Kong, D.P. Yu, B. Zhang, and S.Q. Feng Appl. Phys. Lett. 78 2001 407
15. K. Nomura, H. Ohta, K. Ueda, T. Kamiya, M. Hirano, and H. Hosono Science 300 2003 1269 1272
16. Y.B. Li, Y. Bando, and D. Golberg Appl. Phys. Lett. 84 2004 3603
17. J.H. Lee, Y.W. Chung, M.H. Hon, and I.C. Leu Appl. Phys. A 97 2 2009 403 408
18. Y.W. Heo, L.C. Tien, Y. Kwon, D.P. Norton, S.J. Pearton, B.S. Kang, and F. Ren Appl. Phys. Lett. 85 2004 2274
19. A. Bakin, A. El-Shaer, A.C. Mofor, M. Al-Suleiman, E. Schlenker, and A. Waag Phys. Status Solidi C 4 1 2007 158 161
20. E. Fortunato, P. Barquinha, A. Pimentel, L. Pereira, A. Gonçalves, A. Marques, and R. Martins Appl. Phys. Lett. 85 2004 2541
21. T. Prasada Rao, and M.C. Santhoshkumar App. Surf. Sci. 255 2009 4579 4584
22. B.J. Lokhande, and M.D. Uplane Appl. Surf. Sci. 167 2000 243
23. B.J. Lokhande, P.S. Patil, and M.D. Uplane Mater. Lett. 57 2002 573 579
24. F. Paraguay D., J. Morales, W. Estrada L., E. Andrade, and M. Miki-Yoshida Thin Solid Films 366 2000 16 27
25. P. Nunes, E. Fortunato, and R. Martins Thin Solid Films 383 2001 277 280
26. C.M. Mahajan, M.G. Takwale, International Workshop on Physics of Semiconductor Devices, 2007, pp. 911-914, http://dx.doi.org/10.1109/IWPSD.2007. 4472671.
27. S.E. Demian J. Mater. Sci. Mater. Electron. 5 1994 360 363
28. A. Djelloul, K. Bouzid, and F. Guerrab Turk. J. Phy. 32 2008 49 58
29. C. Eberspacher, A.L. Fahrenbruch, and R.H. Bube Thin Solid Films 136 1986 1 10
30. D. Cossement, and J.M. Streydio J. Cryst. Growth 72 1985 57 60
31. M.G. Ambia, M.N. Islam, and M.O. Hakim J. Mater. Sci. 24 1994 6575 6580
32. H.H. Afify, S.A. Nasser, and S.E. Demian J. Mater. Sci. 2 1991 152 156
33. W.T. Seeber, M.O. Abou-Helal, S. Barth, D. Beil, T. Hoche, H.H. Afify, and S.E. Demian Mater. Sci. Semi. Process. 2 1999 45 55
34. F. Zahedi, R.S. Dariani, and S.M. Rozati Mater. Sci. Semi. Process. 16 2013 245 249
35. M. Krunks, and E. Mellikov Thin Solid Films 270 1995 33 36
36. S. Jongthammanurak, M. Witana, T. Cheawkul, and C. Thanachayanont Mater. Sci. Semi. Process. 16 2013 625 632
37. A.J.C. Fiddes, K. Durose, A.W. Brinkman, J. Woods, P.D. Coates, and A.J. Banister J. Cryst. Growth 159 1996 210 213
38. R. Ayouchi, F. Martin, D. Leinen, and J.R. Ramos-Barrado J. Cryst. Growth 247 2003 497 504
39. H.P. Klung, and L.E. Alexander X-ray Diffraction Procedures for Polycrystalline and Amorphous Materials second ed. 1974 Wiley New York
40. C. Barret, and T.B. Massalski Structure of Metals 1980 Pergamon Oxford
41. K.H. Kim, and J.S. Chun Thin Solid Films 141 1986 287
42. J.C. Manifacier Thin Solid Films 90 1982 297
43. Joint Committee on Powder Diffraction Standards Powder Diffraction File, International Center for Diffraction Data, Swarthmore, PA Data Card 1988 36 1451
44. B. Joseph, K.G. Gopchandran, P.K. Manoj, P. Koshy, and V.K. Vaidyan Bull. Mater. Sci. 22 1999 921
45. C.M. Mahajan, and M.G. Takwale J. Alloys Compd. 2013 http://dx.doi.org/ 10.1016/j.jallcom.2013.08.136
46. V.R. Shinde, C.D. Lokhande, R.S. Mane, and S.H. Han Appl. Surf. Sci. 245 2005 407 413
47. G.L. Mar, P.Y. Timbrell, and R.N. Lamb Chem. Mater. 7 1995 1890
48. V.R. Srikant, and D.R. Clarke J. Appl. Phys. 83 1998 5447
49. Y. Fujita, and T. Kwan J. Res. Inst. Catal. 7 1959 24
50. L.V. Azaroff, and J.J. Brophy Electronic Process in Materials 1963 McGraw-Hill New York 234
51. H. Czternastek, A. Brudnik, and M. Jachimowski Solid State Commun. 65 1988 1025 1029
52. Mustafa Öztas Mater. Sci. Mater. Electron. 17 2006 937 941
53. C.M. Mahajan, A.G. Godbole, S.P. Gumfekar, and S.H. Sonawane Takwale Adv. Mater. Res. 67 2009 103 108
54. G. Haacke J. Appl. Phys. 47 1976 4086