Effect of physical vapor deposited Al 2O 3 film on TGO growth in YSZ/CoNiCrAlY coatings

Ceramics International

Volumn 38, Issue 6, 2012, Pages 5113-5121

  Li, Yanjun ^a   Xie, Youtao ^a   Huang, Liping ^a   Liu, Xuanyong ^a   Zheng, Xuebin ^a  

^a SHANGHAI INSTITUTE OF CERAMICS   (China)

Author keywords

Al 2O 3 film; C. Thermal shock resistance; Residual stress; Thermal barrier coatings

Indexed keywords

BOND COATS; CERAMIC TOP COAT; CONICRALY; ENERGY DISPERSIVE SPECTROMETERS; METALLIC BONDS; MICRO RAMAN SPECTROSCOPY; PHYSICAL VAPOR DEPOSITED; TGO GROWTH; THERMAL EXPOSURE; THERMAL GROWTH; THERMAL SHOCK RESISTANCE;

COATINGS; FILM GROWTH; RAMAN SPECTROSCOPY; RESIDUAL STRESSES; SCANNING ELECTRON MICROSCOPY; THERMAL BARRIER COATINGS; THERMAL SHOCK; VAPORS;

ALUMINUM;

EID: 84862815667     PISSN: 02728842     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ceramint.2012.03.014     Document Type: Article

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