Al+-doping of Si by laser ablation of Al2O 3/SiN passivation

Physica Status Solidi (A) Applications and Materials Science

Volumn 210, Issue 9, 2013, Pages 1871-1873

  Harder, Nils Peter ^a,b   Larionova, Yevgeniya ^a   Brendel, Rolf ^a,b  

^a INSTITUTE FOR SOLAR ENERGY RESEARCH HAMELIN ISFH   (Germany)

^b LEIBNIZ UNIVERSITY HANNOVER   (Germany)

Author keywords

aluminum oxide; laser doping; silicon; solar cells

Indexed keywords

ABLATION PARAMETERS; ALUMINUM OXIDES; DIFFUSED LAYERS; DOPING PROFILES; LASER DOPING; LAYER STACKS; RECOMBINATION ACTIVITY; SATURATION CURRENT DENSITIES;

LASER ABLATION; PASSIVATION; SHEET RESISTANCE; SILICON; SILICON NITRIDE; SILICON WAFERS; SOLAR CELLS;

ALUMINUM;

EID: 84884982217     PISSN: 18626300     EISSN: 18626319     Source Type: Journal    
DOI: 10.1002/pssa.201329058     Document Type: Article

References (17)

1. J. Zhao, A. Wang, M. A. Green, and, F. Ferrazza, Appl. Phys. Lett. 73, 1991 (1998).
2. A. W. Blakers, A. Wang, A. M. Milke, J. Zhao, and, M. A. Green, Appl. Phys. Lett. 55, 1363 (1989).
3. J.-H. Lai, A. Upadhyaya, S. Ramanathan, A. Das, K. Tate, V. Upadhyaya, A. Kapoor, C.-W. Chen, and, A. Rohatgi, IEEE J. Photovolt. 1, 16 (2011).
4. G. Agostinelli, P. Choulat, H. F. W. Dekkers, S. De, Wolf, and, G. Beaucarne, in: Proceedings 20th European Photovoltaic Solar Energy Conference, Barcelona, Spain, 2005, pp. 647-650.
5. S. Gatz, H. Hannebauer, R. Hesse, F. Werner, A. Schmidt, T. Dullweber, J. Schmidt, K. Bothe, and, R. Brendel, Phys. Status Solidi RRL 5, 147 (2011).
6. D. Suwito, U. Jäger, J. Benick, S. Janz, M. Hermle, and, S. W. Glunz, IEEE Trans. Electron Devices 57, 2032 (2010).
7. P. Ortega, I. Martin, G. Lopez, M. Colina, A. Orpella, C. Voz, and, R. Alcubilla, Sol. Energy Mater. Sol. Cells 106, 80 (2012).
8. B. Hoex, J. Schmidt, P. Pohl, M. C. M. van de Sanden, and, W. M. M. Kessels, J. Appl. Phys. 104, 044903 (2008).
9. J. L. van Hemmen, S. B. S. Heil, J. H. Klootwijk, F. Roozeboom, C. J. Hodson, M. S. M. van de Sanden, and, W. M. M. Kessels, J. Electrochem. Soc. 154, G165 (2007).
10. S. Hermann, N.-P. Harder, R. Brendel, D. Herzog, and, H. Haferkamp, Appl. Phys. A 99, 151 (2010).
11. R. A. Sinton, and, A. Cuevas, Appl. Phys. Lett. 69, 2510 (1996).
12. E. Peiner, A. Schlachetzki, and, D. Krüger, J. Electrochem. Soc. 142, 576 (1995).
13. J. R. Köhler, and, S. Eisele, Prog. Photovolt.: Res. Appl. 18, 334 (2010).
14. R. F. Wood, Phys. Rev. B 25, 2786 (1982).
15. D. E. Kane, and, R. M. Swanson, in: Proceedings 18th IEEE PVSC, Las Vegas, USA, 1985, pp. 578-583.
16. B. Hoex, J. Schmidt, R. Bock, P. P. Altermatt, M. C. M. van de Sanden, and, W. M. M. Kessels, Appl. Phys. Lett. 91, 112107 (2007).
17. D. A. Clugston, and, P. A. Basore, in: Proceedings 26th IEEE PVSC, Anaheim, USA, 1997, pp. 207-210