Tunable photoelectrochemical properties by nanostructural control in WO3 thin films prepared by carboxylic acid-assisted electrodeposition

Journal of Physical Chemistry C

Volumn 117, Issue 34, 2013, Pages 17766-17776

  Kwong, Wai Ling ^a   Nakaruk, Auppatham ^a   Koshy, Pramod ^a   Sorrell, Charles C ^a  

^a UNIVERSITY OF NEW SOUTH WALES   (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION KINETICS; NANO-STRUCTURAL CONTROL; NON-LINEAR RELATIONSHIPS; PHOTOCURRENT DENSITY; PHOTOELECTROCHEMICAL MEASUREMENTS; PHOTOELECTROCHEMICAL PERFORMANCE; PHOTOELECTROCHEMICAL PROPERTIES; UV-VIS SPECTROPHOTOMETRY;

ELECTRODEPOSITION; GRAIN GROWTH; HYDROGEN BONDS; OXALIC ACID; SCANNING ELECTRON MICROSCOPY; SURFACE REACTIONS; THIN FILMS; X RAY DIFFRACTION;

ELECTROCHEMISTRY;

EID: 84883318607     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp400499c     Document Type: Article

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