메뉴 건너뛰기




Volumn 34, Issue 9, 2013, Pages 1151-1153

Effects of carrier concentration, indium content, and crystallinity on the electrical properties of indium-tin-zinc-oxide thin-film transistors

Author keywords

Carrier concentration; crystallinity; In content; Indium Tin Zinc oxide (ITZO); next generation displays; thin film transistor (TFT)

Indexed keywords

C. THIN FILM TRANSISTOR (TFT); CRYSTALLINITIES; FIELD-EFFECT MOBILITIES; INDIUM-TIN-ZINC-OXIDE (ITZO); ON/OFF CURRENT RATIO; SUBTHRESHOLD SWING; THIN-FILM TRANSISTOR (TFTS); ULTRAHIGH RESOLUTION;

EID: 84883145520     PISSN: 07413106     EISSN: None     Source Type: Journal    
DOI: 10.1109/LED.2013.2272084     Document Type: Article
Times cited : (41)

References (13)
  • 1
    • 0037415828 scopus 로고    scopus 로고
    • ZnO-based transparent thin-film transistors
    • Feb.
    • R. L. Hoffman, B. J. Norris, and J. F. Wagner, "ZnO-based transparent thin-film transistors," Appl. Phys. Lett., vol. 82, no. 5, pp. 733-735, Feb. 2003.
    • (2003) Appl. Phys. Lett. , vol.82 , Issue.5 , pp. 733-735
    • Hoffman, R.L.1    Norris, B.J.2    Wagner, J.F.3
  • 2
    • 43949087179 scopus 로고    scopus 로고
    • Effect of thickness of ZnO active layer on ZnO-TFT's characteristics
    • DOI 10.1016/j.tsf.2007.07.107, PII S0040609007011996
    • J. H. Chung, J. Y. Lee, H. S. Kim, et al., "Effect of thickness of ZnO active layer on ZnO-TFT's characteristics," Thin Solid Films, vol. 516, no. 16, pp. 5597-5601, Jun. 2008. (Pubitemid 351707450)
    • (2008) Thin Solid Films , vol.516 , Issue.16 , pp. 5597-5601
    • Chung, J.H.1    Lee, J.Y.2    Kim, H.S.3    Jang, N.W.4    Kim, J.H.5
  • 3
    • 33645683083 scopus 로고    scopus 로고
    • Effects of electrical bias stress on the performance of ZnO-based TFTs fabricated by RF magnetron sputtering
    • Mar.
    • R. Navamathavan, E. J. Yang, J. H. Kim, et al., "Effects of electrical bias stress on the performance of ZnO-based TFTs fabricated by RF magnetron sputtering," J. Electrochem. Soc., vol. 153, no. 5, pp. G385-G388, Mar. 2006.
    • (2006) J. Electrochem. Soc. , vol.153 , Issue.5
    • Navamathavan, R.1    Yang, E.J.2    Kim, J.H.3
  • 4
    • 33748795083 scopus 로고    scopus 로고
    • 4 channel favricated by room temperature rf-magnetron sputtering
    • Sep.
    • 4 channel favricated by room temperature rf-magnetron sputtering," Appl. Phys. Lett., vol. 89, no. 11, pp. 112123-1-112123-3, Sep. 2006.
    • (2006) Appl. Phys. Lett. , vol.89 , Issue.11 , pp. 1121231-1121233
    • Yabuta, H.1    Sano, M.2    Abe, K.3
  • 5
    • 84858676946 scopus 로고    scopus 로고
    • High-mobility oxide TFT for circuit integration of AMOLEDs
    • Dec.
    • E. Fukumoto, T. Arai, N. Morosawa, et al., "High-mobility oxide TFT for circuit integration of AMOLEDs," J. Soc. Inf. Display, vol. 19, no. 12, pp. 867-872, Dec. 2011.
    • (2011) J. Soc. Inf. Display , vol.19 , Issue.12 , pp. 867-872
    • Fukumoto, E.1    Arai, T.2    Morosawa, N.3
  • 6
    • 84859408013 scopus 로고    scopus 로고
    • Oxide-TFT technologies for next-generation AMOLED displays
    • Mar.
    • T. Arai, "Oxide-TFT technologies for next-generation AMOLED displays," J. Soc. Inf. Display, vol. 20, no. 3, pp. 156-161, Mar. 2012.
    • (2012) J. Soc. Inf. Display , vol.20 , Issue.3 , pp. 156-161
    • Arai, T.1
  • 8
    • 79953104672 scopus 로고    scopus 로고
    • Electrical and photosensitive characteristics of a-IGZO TFTs related to oxygen vacancy
    • Apr.
    • J. Yao, N. Xu, S. Deng, et al., "Electrical and photosensitive characteristics of a-IGZO TFTs related to oxygen vacancy," IEEE Trans. Electron Devices, vol. 58, no. 4, pp. 1121-1126, Apr. 2011.
    • (2011) IEEE Trans. Electron Devices , vol.58 , Issue.4 , pp. 1121-1126
    • Yao, J.1    Xu, N.2    Deng, S.3
  • 10
    • 69249184461 scopus 로고    scopus 로고
    • High performance thin film transistor with cosputtered amorphous Zn-In-Sn-O channel: Combinatorial approach
    • Aug.
    • M. K. Ryu, S. Yang, S. H. K. Park, et al., "High performance thin film transistor with cosputtered amorphous Zn-In-Sn-O channel: Combinatorial approach," Appl. Phys. Lett., vol. 95, no. 7, pp. 072104-1-072104-3, Aug. 2009.
    • (2009) Appl. Phys. Lett. , vol.95 , Issue.7 , pp. 0721041-0721043
    • Ryu, M.K.1    Yang, S.2    Park, S.H.K.3
  • 11
    • 2942590739 scopus 로고    scopus 로고
    • About the oxygen diffusion mechanism in Zn O
    • May
    • A. C. S. Sabioni, "About the oxygen diffusion mechanism in Zn O," Solid State Ion., vol. 170, nos. 1-2, pp. 145-148, May 2004.
    • (2004) Solid State Ion. , vol.170 , Issue.1-2 , pp. 145-148
    • Sabioni, A.C.S.1
  • 12
    • 70350728609 scopus 로고    scopus 로고
    • Impact of Sn/Zn ratio on the gate bias and temperature-induced instability of Zn-In-Sn-O thin film transistors
    • Oct.
    • M. K. Ryu, S. Yang, S. H. K. Park, et al., "Impact of Sn/Zn ratio on the gate bias and temperature-induced instability of Zn-In-Sn-O thin film transistors," Appl. Phys. Lett., vol. 95, no. 17, pp. 173508-1-173508-3, Oct. 2009.
    • (2009) Appl. Phys. Lett. , vol.95 , Issue.17 , pp. 1735081-1735083
    • Ryu, M.K.1    Yang, S.2    Park, S.H.K.3
  • 13
    • 0346935143 scopus 로고    scopus 로고
    • Modeling and simulation of polycrystalline ZnO thin-film transistors
    • Dec.
    • F. M. Hossain, J. Nishii, S. Takagi, et al., "Modeling and simulation of polycrystalline ZnO thin-film transistors," J. Appl. Phys., vol. 94, no. 12, pp. 7768-7777, Dec. 2003.
    • (2003) J. Appl. Phys. , vol.94 , Issue.12 , pp. 7768-7777
    • Hossain, F.M.1    Nishii, J.2    Takagi, S.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.