메뉴 건너뛰기




Volumn 26, Issue 3, 2013, Pages 319-327

Multiparametric virtual metrology model building by job-shop data fusion using a markov chain monte carlo method

Author keywords

Advanced process control (APC); chemical mechanical polishing (CMP); Markov chain Monte Carlo (MCMC); virtual metrology (VM)

Indexed keywords

BAYESIAN NETWORKS; CHAINS; DATA FUSION; MARKOV PROCESSES; MONTE CARLO METHODS;

EID: 84881320809     PISSN: 08946507     EISSN: None     Source Type: Journal    
DOI: 10.1109/TSM.2013.2257897     Document Type: Article
Times cited : (6)

References (14)
  • 2
    • 33646730899 scopus 로고    scopus 로고
    • Intelligent prognostics system design and implementation
    • May
    • Y.-C. Su, F.-T. Cheng, M.-H. Hung, and H.-C. Huang, "Intelligent prognostics system design and implementation," IEEE Trans. Semicond. Manuf., vol. 19, no. 2, pp. 195-207, May 2006.
    • (2006) IEEE Trans. Semicond. Manuf , vol.19 , Issue.2 , pp. 195-207
    • Su, Y.-C.1    Cheng, F.-T.2    Hung, M.-H.3    Huang, H.-C.4
  • 3
    • 33646725309 scopus 로고    scopus 로고
    • A processing quality prognostics scheme for plasma sputtering in TFT-LCD manufacturing
    • May
    • Y.-C. Su, M.-H. Hung, F.-T. Cheng, and Y.-T. Chen, "A processing quality prognostics scheme for plasma sputtering in TFT-LCD manufacturing," IEEE Trans. Semicond. Manuf., vol. 19, no. 2, pp. 183-194, May 2006.
    • (2006) IEEE Trans. Semicond. Manuf , vol.19 , Issue.2 , pp. 183-194
    • Su, Y.-C.1    Hung, M.-H.2    Cheng, F.-T.3    Chen, Y.-T.4
  • 5
    • 34347398446 scopus 로고    scopus 로고
    • A novel virtual metrology scheme for predicting CVD thickness in semiconductor manufacturing
    • DOI 10.1109/TMECH.2007.897275, Advanced Integrated Mechatronics
    • M.-H. Hung, T.-H. Lin, F.-T. Cheng, and R.-C. Lin, "A novel virtual metrology scheme for predicting CVD thickness in semiconductor manufacturing," IEEE/ASME Trans. Mechatron., vol. 12, no. 3, pp. 308-316, Jun. 2007. (Pubitemid 47018782)
    • (2007) IEEE/ASME Transactions on Mechatronics , vol.12 , Issue.3 , pp. 308-316
    • Hung, M.-H.1    Lin, T.-H.2    Cheng, F.-T.3    Lin, R.-C.4
  • 6
    • 49149109532 scopus 로고    scopus 로고
    • An approach for factorywide control utilizing virtual metrology
    • Nov
    • A. A. Khan, J. R. Moyne, and D. M. Tilbury, "An approach for factorywide control utilizing virtual metrology," IEEE Trans. Semicond. Manuf., vol. 20, no. 4, pp. 364-375, Nov. 2007.
    • (2007) IEEE Trans. Semicond. Manuf , vol.20 , Issue.4 , pp. 364-375
    • Khan, A.A.1    Moyne, J.R.2    Tilbury, D.M.3
  • 7
    • 77954398443 scopus 로고    scopus 로고
    • Virtual metrology for plasma particle in plasma etching equipment
    • S. Imai, "Virtual metrology for plasma particle in plasma etching equipment," in Proc. ISSM, 2007, pp. 1-4.
    • (2007) Proc. ISSM , pp. 1-4
    • Imai, S.1
  • 8
    • 38949117544 scopus 로고    scopus 로고
    • Evaluating reliance level of a virtual metrology system
    • Feb
    • F.-T. Cheng, Y.-T. Chen, Y.-C. Su, and D.-L. Zeng, "Evaluating reliance level of a virtual metrology system," IEEE Trans. Semicond. Manuf., vol. 21, no. 1, pp. 92-103, Feb. 2008.
    • (2008) IEEE Trans. Semicond. Manuf , vol.21 , Issue.1 , pp. 92-103
    • Cheng, F.-T.1    Chen, Y.-T.2    Su, Y.-C.3    Zeng, D.-L.4
  • 12
    • 77954196403 scopus 로고    scopus 로고
    • PyMC: Bayesian stochastic modelling in Python
    • A. Patil, D. Huard, and C. J. Fonnesbeck, "PyMC: Bayesian stochastic modelling in Python," J. Statist. Software, vol. 35, no. 4, pp. 1-81, 2010.
    • (2010) J. Statist. Software , vol.35 , Issue.4 , pp. 1-81
    • Patil, A.1    Huard, D.2    Fonnesbeck, C.J.3
  • 13
    • 84881320826 scopus 로고    scopus 로고
    • Semiconductor CMP process control predicting degradation effect of consumed materials
    • Jun.
    • K. Tamaki and S. Kaneko, "Semiconductor CMP process control predicting degradation effect of consumed materials," SICE Trans., vol. 48, no. 6, pp. 326-334, Jun. 2012.
    • (2012) SICE Trans , vol.48 , Issue.6 , pp. 326-334
    • Tamaki, K.1    Kaneko, S.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.