High-temperature oxidation resistance of SiC thin films deposited by magnetron sputtering

Cailiao Rechuli Xuebao/Transactions of Materials and Heat Treatment

Volumn 34, Issue SUPPL.1, 2013, Pages 135-138

  Li, Hui ^a   Li, He Qin ^a   Hu, Ren Jie ^a   Zhang, Yuan Yuan ^a  

^a HEFEI UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

RF magnetron sputtering; SiC thin film; SiO2 resistance of oxidation

Indexed keywords

AIR ATMOSPHERE; ANNEALING TEMPERATURES; FTIR; RF-MAGNETRON SPUTTERING; ROOM TEMPERATURE; SI (100) SUBSTRATE; SIC FILMS; SIC THIN FILMS;

ANNEALING; MAGNETRON SPUTTERING; SILICON CARBIDE;

THIN FILMS;

EID: 84881010471     PISSN: 10096264     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (13)

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