X-ray spectroscopic methods in the studies of nonstoichiometric TiO 2-x thin films

Applied Surface Science

Volumn 281, Issue , 2013, Pages 100-104

  Kollbek, K ^a   Sikora, M ^a   Kapusta, Cz ^a   Szlachetko, J ^b,c   Zakrzewska, K ^a   Kowalski, K ^a   Radecka, M ^a  

^a AGH UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Poland)

^b PAUL SCHERRER INSTITUTE   (Switzerland)

^c JAN KOCHANOWSKI UNIVERSITY   (Poland)

Author keywords

1s3p(3d) RXES; Impedance spectroscopy; Nonstoichiometric thin films; Optical properties; Titanium dioxide; XPS; XRD

Indexed keywords

AMORPHOUS FILMS; ENERGY GAP; OPTICAL EMISSION SPECTROSCOPY; OPTICAL FILMS; OPTICAL PROPERTIES; OXIDE MINERALS; REACTIVE SPUTTERING; SPECTROSCOPIC ANALYSIS; THIN FILMS; TITANIUM DIOXIDE; X RAY ABSORPTION; X RAY DIFFRACTION;

1S3P(3D) RXES; ELECTRONIC AND STRUCTURAL PROPERTIES; IMPEDANCE SPECTROSCOPY; NON-STOICHIOMETRIC; OPTICAL SPECTROPHOTOMETRY; RESONANT X-RAY EMISSION SPECTROSCOPIES; SPECTROSCOPIC TECHNIQUE; STOICHIOMETRIC COMPOSITIONS;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 84880326167     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2013.02.119     Document Type: Conference Paper

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