Investigation of ablation thresholds of optical materials using 1-μm-focusing beam at hard Xray free electron laser

Optics Express

Volumn 21, Issue 13, 2013, Pages 15382-15388

  Koyama, Takahisa ^a   Yumoto, Hirokatsu ^a   Senba, Yasunori ^a   Tono, Kensuke ^a   Sato, Takahiro ^a   Togashi, Tadashi ^a   Inubushi, Yuichi ^b   Katayama, Tetsuo ^a   Kim, Jangwoo ^c   Matsuyama, Satoshi ^c   Mimura, Hidekazu ^d   Yabashi, Makina ^b   Yamauchi, Kazuto ^c   Ohashi, Haruhiko ^a   Ishikawa, Tetsuya ^b  

^a JAPAN SYNCHROTRON RADIATION RESEARCH INSTITUTE   (Japan)

^b RIKEN SPring 8 Center ^*  (Japan)

^c OSAKA UNIVERSITY   (Japan)

^d UNIVERSITY OF TOKYO   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

FREE ELECTRON LASERS; OPTICAL MATERIALS; SILICA; SILICON; SILICON OXIDES; SUBSTRATES; X RAYS;

ABLATION THRESHOLDS; HARD X RAY; IRRADIATION EXPERIMENTS; MECHANICAL CRACKING; PHOTON ENERGY; SIDE WALLS; SILICON SUBSTRATES; X RAY MIRRORS;

ABLATION;

EID: 84879967026     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.21.015382     Document Type: Article

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