Interaction of short x-ray pulses with low-Z x-ray optics materials at the LCLS free-electron laser

Optics Express

Volumn 18, Issue 23, 2010, Pages 23933-23938

  Hau Riege, S P ^a   London, R A ^a   Graf, A ^a   Baker, S L ^a   Soufli, R ^a   Sobierajski, R ^a   Burian, T ^b,c   Chalupsky, J ^d   Juha, L ^d,e   Gaudin, J ^d   Krzywinski, J ^f   Moeller, S ^g   Messerschmidt, M ^g   Bozek, J ^g   Bostedt, C ^g  

^a LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

^b INSTITUTE OF PHYSICS   (Poland)

^c FOM INSTITUTE FOR PLASMA PHYSICS RIJNHUIZEN   (Netherlands)

^d INSTITUTE OF PHYSICS   (Czech Republic)

^e CZECH TECHNICAL UNIVERSITY IN PRAGUE   (Czech Republic)

^f EUROPEAN XFEL GMBH   (Germany)

^g SLAC NATIONAL ACCELERATOR LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BORON CARBIDE; FILMS; FREE ELECTRON LASERS; LIGHT SOURCES; SILICON CARBIDE;

FLUENCES; HARD X RAY; LINAC COHERENT LIGHT SOURCE; MECHANICAL CRACKING; MULTIPLE PULSE; PENETRATION DEPTH; PULSE ENERGIES; SHORT-PULSE; SIC FILMS; SINGLE PULSE; X RAY PULSE;

X RAYS;

EID: 78149452884     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.18.023933     Document Type: Article

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