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Volumn , Issue , 2012, Pages 77-79

The effects of sub-contact nitrogen doping on silicon carbide photoconductive semiconductor switches

Author keywords

High voltage; Ohmic contact; Photoconductive semiconductor switch; Silicon carbide

Indexed keywords

EFFICIENT ELECTRON INJECTION; HIGH VOLTAGE; HIGH-PURITY SEMI-INSULATING 4H-SIC; LASER ENHANCED DIFFUSIONS; PHOTOCONDUCTIVE SEMICONDUCTOR SWITCHES; SCHOTTKY BARRIER HEIGHTS; SILICON CARBIDES (SIC); WIDE-BAND-GAP SEMICONDUCTOR;

EID: 84879904496     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/IPMHVC.2012.6518684     Document Type: Conference Paper
Times cited : (2)

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    • G. Katulka, et al., A technique to reduce The contact resistance to 4Hsilicon carbide using germanium implantation, JOURNAL OF ELECTRONIC MATERIALS, Volume 31, Number 5 (2002), 346-350, DOI: 10.1007/s11664-002-0080-0
    • (2002) JOURNAL of ELECTRONIC MATERIALS , vol.31 , Issue.5 , pp. 346-350
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  • 2
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    • Nickel ohmic contacts to n-implanted (0001) 4h-sic
    • DOI: 10.1007/s11664-010-1128-1
    • M. Li, et al., Nickel Ohmic Contacts to N-Implanted (0001) 4H-SiC, JOURNAL OF ELECTRONIC MATERIAL, Volume 39, Number 5 (2010), 540-544, DOI: 10.1007/s11664-010-1128-1
    • (2010) JOURNAL of ELECTRONIC MATERIAL , vol.39 , Issue.5 , pp. 540-544
    • Li, M.1
  • 3
    • 0032615496 scopus 로고    scopus 로고
    • doi: 10.1063/1.369735
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    • (1999) J. Appl. Phys , vol.85 , pp. 3701
  • 4
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    • doi: 10.1063/1.370799
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.