-
1
-
-
84879532763
-
-
Presentation by Yole Development at CS - Europe 2012
-
Presentation by Yole Development at CS - Europe 2012
-
-
-
-
2
-
-
2442628389
-
New unipolar switching power device figure of merits
-
10.1109/LED.2004.826533 0741-3106
-
Huang A Q 2004 New unipolar switching power device figure of merits IEEE Electron Device Lett. 25 298-301
-
(2004)
IEEE Electron Device Lett.
, vol.25
, Issue.5
, pp. 298-301
-
-
Huang, A.Q.1
-
3
-
-
33748509732
-
High breakdown voltage achieved on AlGaN/GaN HEMTs with integrated slant field plates
-
DOI 10.1109/LED.2006.881020
-
Dora Y, Chakraborty A, McCarthy L, Keller S, Denbaars S P and Mishra U K 2006 High breakdown voltage achieved on AlGaN/GaN HEMTs with integrated slant field plates IEEE Electron Device Lett. 27 713-5 (Pubitemid 44355884)
-
(2006)
IEEE Electron Device Letters
, vol.27
, Issue.9
, pp. 713-715
-
-
Dora, Y.1
Chakraborty, A.2
McCarthy, L.3
Keller, S.4
Denbaars, S.P.5
Mishra, U.K.6
-
4
-
-
67649342389
-
Breakdown enhancement of AlGaN/GaN HEMTs on 4-in silicon by improving the GaN quality on thick buffer layers
-
10.1109/LED.2009.2018288 0741-3106
-
Selvaraj S L, Suzue T and Egawa T 2009 Breakdown enhancement of AlGaN/GaN HEMTs on 4-in silicon by improving the GaN quality on thick buffer layers IEEE Electron Device Lett. 30 587-9
-
(2009)
IEEE Electron Device Lett.
, vol.30
, Issue.6
, pp. 587-589
-
-
Selvaraj, S.L.1
Suzue, T.2
Egawa, T.3
-
5
-
-
77956105850
-
High breakdown (>1500 V) AlGaN/GaN HEMTs by substrate-transfer technology
-
10.1109/LED.2010.2052587 0741-3106
-
Lu B and Palacios T 2010 High breakdown (>1500 V) AlGaN/GaN HEMTs by substrate-transfer technology IEEE Electron Device Lett. 31 951-3
-
(2010)
IEEE Electron Device Lett.
, vol.31
, Issue.9
, pp. 951-953
-
-
Lu, B.1
Palacios, T.2
-
6
-
-
79955537988
-
1200-V normally off GaN-on-Si field-effect transistors with low dynamic on-resistance
-
10.1109/LED.2011.2118190 0741-3106
-
Chu R, Corrion A, Chen M, Ray L, Wong D, Zehnder D, Hughes B and Boutros K 2011 1200-V normally Off GaN-on-Si field-effect transistors with low dynamic on-resistance IEEE Electron Device Lett. 32 632-4
-
(2011)
IEEE Electron Device Lett.
, vol.32
, Issue.5
, pp. 632-634
-
-
Chu, R.1
Corrion, A.2
Chen, M.3
Ray, L.4
Wong, D.5
Zehnder, D.6
Hughes, B.7
Boutros, K.8
-
7
-
-
0020098824
-
Semiconductors for high-voltage, vertical channel field effect transistors
-
DOI 10.1063/1.331646
-
Baliga B J 1982 Semiconductors for high voltage, vertical channel FETs J. Appl. Phys. 53 1759-64 (Pubitemid 12524221)
-
(1982)
Journal of Applied Physics
, vol.53
, Issue.3 PART 1
, pp. 1759-1764
-
-
Baliga, B.J.1
-
8
-
-
1542366576
-
AlGaN/GaN current aperture vertical electron transistors with regrown channels
-
10.1063/1.1641520 0021-8979
-
Ben-Yaacov I, Seck Y-K, Mishra U K and Denbaars S P 2004 AlGaN/GaN current aperture vertical electron transistors with regrown channels J. Appl. Phys. 95 2073-8
-
(2004)
J. Appl. Phys.
, vol.95
, Issue.4
, pp. 2073-2078
-
-
Ben-Yaacov, I.1
Seck, Y.-K.2
Mishra, U.K.3
Denbaars, S.P.4
-
9
-
-
44849087614
-
Enhancement and depletion mode AlGaN/GaN CAVET with Mg-ion-implanted GaN as current blocking layer
-
DOI 10.1109/LED.2008.922982
-
Chowdhury S, Swenson B L and Mishra U K 2008 Enhancement and depletion mode AlGaN/GaN CAVET with Mg-Ion-implanted GaN as current blocking layer IEEE Electron Device Lett. 29 543-5 (Pubitemid 351791448)
-
(2008)
IEEE Electron Device Letters
, vol.29
, Issue.6
, pp. 543-545
-
-
Chowdhury, S.1
Swenson, B.L.2
Mishra, U.K.3
-
10
-
-
84655160777
-
CAVET on bulk GaN substrates achieved with MBE-regrown AlGaN/GaN layers to suppress dispersion
-
10.1109/LED.2011.2173456 0741-3106
-
Chowdhury S, Wong M H, Swenson B L and Mishra U K 2012 CAVET on bulk GaN substrates achieved with MBE-regrown AlGaN/GaN layers to suppress dispersion IEEE Electron Device Lett. 33 41-3
-
(2012)
IEEE Electron Device Lett.
, vol.33
, Issue.1
, pp. 41-43
-
-
Chowdhury, S.1
Wong, M.H.2
Swenson, B.L.3
Mishra, U.K.4
-
11
-
-
34547829020
-
A vertical insulated gate AlGaN/GaN heterojunction field-effect transistor
-
DOI 10.1143/JJAP.46.L503
-
Kanechika M, Sugimoto M, Soeima N, Ueda H, Ishiguro O, Kodama M, Hayashi E, Itoh K, Uesugi T and Kachi T 2007 A verticalinsulated gate AlGaN/GaN hetrojunction field effect transisitor Japan. J. Appl. Phys. 46 L503-5 (Pubitemid 47245315)
-
(2007)
Japanese Journal of Applied Physics, Part 2: Letters
, vol.46
, Issue.20-24
-
-
Kanechika, M.1
Sugimoto, M.2
Soejima, N.3
Ueda, H.4
Ishiguro, O.5
Kodama, M.6
Hayashi, E.7
Itoh, K.8
Uesugi, T.9
Kachi, T.10
-
12
-
-
57049157748
-
Vertical GaN-Based trench gate metal oxide semiconductor field-effect transistors on GaN bulk substrates
-
10.1143/APEX.1.011105 1882-0778 011105
-
Otake H, Chikamatsu K, Yamaguchi A, Fujishima T and Ohta H 2008 Vertical GaN-Based trench gate metal oxide semiconductor field-effect transistors on GaN bulk substrates Appl. Phys. Express 1 011105.
-
(2008)
Appl. Phys. Express
, vol.1
, Issue.1
-
-
Otake, H.1
Chikamatsu, K.2
Yamaguchi, A.3
Fujishima, T.4
Ohta, H.5
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