Defining plasma polymerization: New insight into what we should be measuring

ACS Applied Materials and Interfaces

Volumn 5, Issue 12, 2013, Pages 5387-5391

  Michelmore, Andrew ^a   Charles, Christine ^b   Boswell, Rod W ^b   Short, Robert D ^a   Whittle, Jason D ^a  

^a UNIVERSITY OF SOUTH AUSTRALIA   (Australia)

^b AUSTRALIAN NATIONAL UNIVERSITY   (Australia)

Author keywords

deposition rate; functional retention; ion flux; plasma polymerization

Indexed keywords

FUNCTIONAL RETENTION; INTRINSIC PARAMETERS; ION FLUXES; PARALLEL-PLATE ELECTRODES; PLASMA POLYMER FILMS; POLYMERIZATION PROCESS; POWER COUPLING EFFICIENCY; PRECURSOR FLOW RATES;

DEPOSITION RATES; GEOMETRY; IONS; POLYMER FILMS;

PLASMA POLYMERIZATION;

EID: 84879530626     PISSN: 19448244     EISSN: 19448252     Source Type: Journal    
DOI: 10.1021/am401484b     Document Type: Article

References (49)

1. Bretagnol, F.; Valsesia, A.; Sasaki, T.; Ceccone, G.; Colpo, P.; Rossi, F. Adv. Mater. 2007, 19, 1947-1950
2. Muir, B. W.; Fairbrother, A.; Gengenbach, T. R.; Rovere, F.; Abdo, M. A.; McLean, K. M.; Hartley, P. G. Adv. Mater. 2006, 18, 3079-3082
3. Shi, D. L.; Guo, Y.; Dong, Z. Y.; Lian, J.; Wang, W.; Liu, G. K.; Wang, L. M.; Ewing, R. C. Adv. Mater. 2007, 19, 4033-4037
4. Vasilev, K.; Sah, V.; Anselme, K.; Ndi, C.; Mateescu, M.; Dollmann, B.; Martinek, P.; Ys, H.; Ploux, L.; Griesser, H. J. Nano Lett. 2010, 10, 202-207
5. Singamaneni, S.; McConney, M. E.; LeMieux, M. C.; Jiang, H.; Enlow, J. O.; Bunning, T. J.; Naik, R. R.; Tsukruk, V. V. Adv. Mater. 2007, 19, 4248-4255
6. Mierczynska, A.; Michelmore, A.; Tripathi, A.; Goreham, R. V.; Sedev, R.; Vasilev, K. Soft Matter 2012, 8, 8399-8404
7. Goodman, J. J. Polym. Sci. 1960, 44, 551-552
8. Williams, T.; Hayes, M. W. Nature 1966, 209, 769-773
9. Griesser, H. J. Vacuum 1989, 39, 485-488
10. Alexander, M. R.; Duc, T. M. J. Mater. Chem. 1998, 8, 937-943
11. Barry, J. J. A.; Howard, D.; Shakesheff, K. M.; Howdle, S. M.; Alexander, M. R. Adv. Mater. 2006, 18, 1406-1410
12. Cho, J.; Denes, F. S.; Timmons, R. B. Chem. Mater. 2006, 18, 2989-2996
13. Bhattacharyya, D.; Yoon, W.-J.; Berger, P. R.; Timmons, R. B. Adv. Mater. 2008, 20, 2383-2388
14. Alf, M. E.; Asatekin, A.; Barr, M. C.; Baxamusa, S. H.; Chelawat, H.; Ozaydin-Ince, G.; Petruczok, C. D.; Sreenivasan, R.; Tenhaeff, W. E.; Trujillo, N. J.; Vaddiraju, S.; Xu, J.; Gleason, K. K. Adv. Mater. 2010, 22, 1993-2027
15. Lin, P. A.; Sankaran, R. M. Angew. Chem., Int. Ed. 2011, 50, 10953-10956
16. Flory, P. J. Principles of Polymer Chemistry; Cornell University Press: New York, 1953.
17. Yasuda, H. K. Plasma Polymerization; Academic Press: London, U.K., 1985.
18. Zheng, J.; Yang, R.; Xie, L.; Qu, J.; Liu, Y.; Li, X. Adv. Mater. 2010, 22, 1451-1473
19. Friedrich, J. Plasma Process. Polym. 2011, 8, 783-802
20. Hou, X.; Zhang, H.; Jiang, L. Angew. Chem., Int. Ed. 2012, 51, 5296-5307
21. Yasuda, H. K.; Hsu, T. J. Polym. Sci.: Polym. Chem. Ed. 1977, 15, 81-97
22. Candan, S.; Beck, A. J.; O'Toole, L.; Short, R. D.; Goodyear, A.; Braithwaite, N.; St, J. Phys. Chem. Chem. Phys. 1999, 1, 3117-3121
23. Beck, A. J.; Candan, S.; Short, R. D.; Goodyear, A.; Braithwaite, N.; St, J. J. Phys. Chem. B 2001, 105, 5730-5736
24. Michelmore, A.; Bryant, P. M.; Steele, D. A.; Vasilev, K.; Bradley, J. W.; Short, R. D. Langmuir 2011, 27, 11943-11950
25. Denaro, A. R.; Owens, P. A.; Crawshaw, A. Eur. Polym. J. 1968, 4, 93-106
26. Westwood, A. R. Eur. Polym. J. 1971, 7, 363-375
27. Choukourov, A.; Kousal, J.; Slavinska, D.; Biederman, H.; Fuoco, E. R.; Tepavcevic, S.; Saucedo, J.; Hanley, L. Vacuum 2004, 75, 195-205
28. Martinu, L.; Klemberg-Sapieha, J. E.; Kuttel, O. M.; Raveh, A.; Wertheimer, M. R. J Vac Sci Technol A 1994, 12, 1360-1364
29. Lee, K.; Deal, M.; McVittie, J.; Plummer, J.; Saraswat, K. Proceedings of the IEEE International Interconnect Technology Conference; IEEE: Piscataway, NJ, 1998; pp 175-177
30. Braithwaite, N.; St, J.; Booth, J. P.; Cunge, G. Plasma Sources Sci. Technol. 1996, 5, 677-684
31. Sciarratta, V.; Hegemann, D.; Müller, M.; Vohrer, U.; Oehr, C. Upscaling of Plasma Processes for Carboxyl Functionalization. Plasma Processes and Polymers; Wiley VCH Verlag GmbH & Co. KGaA: Weinheim, Germany, 2005.
32. Sobolewski, M. A. Appl. Phys. Lett. 1998, 72, 1146-1148
33. Barton, D.; Shard, A. G.; Short, R. D.; Bradley, J. W. J. Phys. Chem. B 2005, 109, 3207-3211
34. O'Toole, L.; Beck, A. J.; Ameen, A. P.; Jones, F. R.; Short, R. D. J. Chem. Soc. Faraday Trans. 1995, 91, 3907-3912
35. O'Toole, L.; Beck, A. J.; Short, R. D. Macromolecules 1996, 29, 5172-5177
36. Michelmore, A.; Gross-Kosche, P.; Al-Bataineh, S. A.; Whittle, J. D.; Short, R. D. Langmuir 2013, 29, 2595-2601
37. d'Agostino, R.; Palumbo, F. Plasma Process. Polym. 2012, 9, 844-849
38. Charles, C.; Boswell, R. W. J. Appl. Phys. 1997, 81, 43-49
39. Awaja, F.; Zheng, S.; James, N.; McKenzie, D. R. Plasma Process. Polym. 2012, 9, 174-179
40. Barton, D.; Short, R. D.; Fraser, S.; Bradley, J. W. Chem Commun. 2003, 3, 348-349
41. Steele, D. A.; Short, R. D.; Brown, P.; Mayhew, C. A. Plasma Process. Polym. 2011, 8, 287-294
42. Charles, C.; Boswell, R. W. Plasma Sources Sci. Technol. 2012, 21, 022002
43. Menzies, D.; Gengenbach, T.; Forsythe, J. S.; Birbilis, N.; Johnson, G.; Charles, C.; McFarland, G.; Williams, R. J.; Fong, C.; Leech, P.; McLean, K.; Muir, B. W. Chem. Commun. 2012, 48, 1907-1909
44. Lafleur, T.; Boswell, R. W.; Booth, J. P. Phys. Plasmas 2012, 19, 194101
45. Gahan, D.; Daniels, S.; Hayden, C.; O' Sullivan, D.; Hopkins, M. B. Plasma Sources Sci. Technol. 2012, 21, 015002
46. Lieberman, M. A.; Lichtenberg, A. J. Principles of Plasma Discharges and Materials Processing; John Wiley and Sons: Hoboken, NJ, 2005.
47. Brookes, P. N.; Fraser, S.; Short, R. D.; Hanley, L.; Fuoco, E.; Roberts, A.; Hutton, S. J. Electron Spectros. Relat. Phenom. 2001, 121, 281-297
48. Takahashi, K.; Charles, C.; Boswell, R.; Lieberman, M. A.; Hatakeyama, R. J. Phys. D: Appl. Phys. 2010, 43, 162001
49. Michelmore, A.; Steele, D. A.; Robinson, D. E.; Whittle, J. D.; Short, R-. D. Soft Matter 2013, 9, 6167-6175