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Angewandte Chemie - International Edition

Volumn 50, Issue 46, 2011, Pages 10953-10956

Plasma-assisted dissociation of organometallic vapors for continuous, gas-phase preparation of multimetallic nanoparticles

(2) Lin, Pin Ann a Sankaran, R Mohan a

a Case Western Reserve University (United States)

Author keywords

chemical vapor deposition; copper; microplasma; nanoparticles; nickel

Indexed keywords

GASPHASE; MICRO-PLASMAS; MICROPLASMA; MULTIMETALLIC NANOPARTICLES; ORGANOMETALLIC COMPOUNDS; ORGANOMETALLIC VAPORS; VAPOR CONCENTRATIONS; VAPOR MIXTURE;

CHEMICAL COMPOUNDS; CHEMICAL VAPOR DEPOSITION; METAMATERIALS; ORGANOMETALLICS; PLASMA DEPOSITION; PLASMA DEVICES; VAPORS;

NANOPARTICLES;

EID: 80855156742 PISSN: 14337851 EISSN: 15213773 Source Type: Journal
DOI: 10.1002/anie.201101881 Document Type: Article

Times cited : (44)

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