SCOPUS 정보 검색 플랫폼

Plasma Processes and Polymers

Volumn 9, Issue 9, 2012, Pages 844-849

Comment on "ion-assisted processes of polymerization in low-pressure plasmas"

(2) D'Agostino, Riccardo a,b Palumbo, Fabio b

a UNIVERSITY OF BARI (Italy)

b CNR Consiglio Nazionale delle Ricerche (Italy)

Author keywords

activated growth model; ion bombardment; ion assisted deposition; plasma polymerization

Indexed keywords

EID: 84866370595 PISSN: 16128850 EISSN: 16128869 Source Type: Journal
DOI: 10.1002/ppap.201200072 Document Type: Note

Times cited : (11)

References (38)

1
- 67651207834
- D. Hegemann, E. Koerner, S. Guimond, Plasma Process. Polym. 2009, 6, 246.
- (2009) Plasma Process. Polym. , vol.6 , pp. 246
- Hegemann, D.¹ Koerner, E.² Guimond, S.³

2
- 77952975231
- R. Short, D. Steele, Plasma Process. Polym. 2010, 7, 366.
- (2010) Plasma Process. Polym. , vol.7 , pp. 366
- Short, R.¹ Steele, D.²

3
- 77953002681
- D. Hegemann, Plasma Process. Polym. 2010, 7, 371.
- (2010) Plasma Process. Polym. , vol.7 , pp. 371
- Hegemann, D.¹

4
- 77952986620
- D. Hegemann, D. A. Steele, R. D. Short, Plasma Process. Polym. 2010, 7, 365.
- (2010) Plasma Process. Polym. , vol.7 , pp. 365
- Hegemann, D.¹ Steele, D.A.² Short, R.D.³

5
- 77952960752
- K. K. Gleason, Plasma Process. Polym. 2010, 7, 380.
- (2010) Plasma Process. Polym. , vol.7 , pp. 380
- Gleason, K.K.¹

6
- 77952998778
- A. von Keudell, Plasma Process. Polym. 2010, 7, 376.
- (2010) Plasma Process. Polym. , vol.7 , pp. 376
- Von Keudell, A.¹

7
- 80052712196
- J. Friedrich, Plasma Process. Polym. 2011, 8, 783.
- (2011) Plasma Process. Polym. , vol.8 , pp. 783
- Friedrich, J.¹

8
- 79959700957
- H. Biederman, O. Kylián, Plasma Process. Polym. 2011, 8, 475.
- (2011) Plasma Process. Polym. , vol.8 , pp. 475
- Biederman, H.¹ Kylián, O.²

9
- 78649593741
- M. C. M. van de Sanden, Plasma Process. Polym. 2010, 7, 887.
- (2010) Plasma Process. Polym. , vol.7 , pp. 887
- Van De Sanden, M.C.M.¹

10
- 0022128997
- R. d'Agostino, P. Capezzuto, G. Bruno, F. Cramarossa, Pure Appl. Chem. 1985, 57, 1287.
- (1985) Pure Appl. Chem. , vol.57 , pp. 1287
- D'Agostino, R.¹ Capezzuto, P.² Bruno, G.³ Cramarossa, F.⁴

11
- 0022789766
- R. d'Agostino, F. Cramarossa, F. Fracassi, E. Desimoni, L. Sabbatini, P. G. Zambonin, G. Caporiccio, Thin Solid Films 1986, 143, 163.
- (1986) Thin Solid Films , vol.143 , pp. 163
- D'Agostino, R.¹ Cramarossa, F.² Fracassi, F.³ Desimoni, E.⁴ Sabbatini, L.⁵ Zambonin, P.G.⁶ Caporiccio, G.⁷

12
- 3743086990
- K. Masek, L. Laska, R. d'Agostino, F. Cramarossa, Contrib. Plasma Phys. 1987, 27, 15.
- (1987) Contrib. Plasma Phys. , vol.27 , pp. 15
- Masek, K.¹ Laska, L.² D'Agostino, R.³ Cramarossa, F.⁴

13
- 21544445961
- R. d'Agostino, F. Cramarossa, F. Illuzzi, J. Appl. Phys. 1987, 61, 2754.
- (1987) J. Appl. Phys. , vol.61 , pp. 2754
- D'Agostino, R.¹ Cramarossa, F.² Illuzzi, F.³

14
- 21544462094
- F. Fracassi, E. Occhiello, J. W. Coburn, J. Appl. Phys. 1987, 62, 3980.
- (1987) J. Appl. Phys. , vol.62 , pp. 3980
- Fracassi, F.¹ Occhiello, E.² Coburn, J.W.³

15
- 0018469799
- J. W. Coburn, H. F. Winters, J. Appl. Phys. 1979, 59, 3189.
- (1979) J. Appl. Phys. , vol.59 , pp. 3189
- Coburn, J.W.¹ Winters, H.F.²

16
- 0020736395
- H. F. Winters, J. W. Coburn, T. J. Chuang, J. Vac. Sci. Technol., B 1983, 1, 469.
- (1983) J. Vac. Sci. Technol., B , vol.1 , pp. 469
- Winters, H.F.¹ Coburn, J.W.² Chuang, T.J.³

17
- 0006606314
- in, S. M. Rossnagel, Ed., Park Ridge, NJ Noyes, p.
- G. S. Oehrlein, in Reactive Ion Etching: Handbook of Plasma Processing Technology, S. M. Rossnagel, Ed., Park Ridge, NJ Noyes 1990, p. 196.
- (1990) Reactive Ion Etching: Handbook of Plasma Processing Technology , pp. 196
- Oehrlein, G.S.¹

18
- 0020594814
- D. L. Flamm, V. M. Donnelly, D. E. Ibbotson, J. Vac. Sci. Technol., B 1983, 1, 23.
- (1983) J. Vac. Sci. Technol., B , vol.1 , pp. 23
- Flamm, D.L.¹ Donnelly, V.M.² Ibbotson, D.E.³

19
- 0003400638
- Brian Chapman, John Wiley & Sons
- Glow Discharge Processes: Sputtering and Plasma Etching, Brian Chapman, John Wiley & Sons 1980.
- (1980) Glow Discharge Processes: Sputtering and Plasma Etching

20
- 33645044059
- in, P. F. Williams, Ed., NATO ASI Series, Kluwer Academic Publishers, Dordrecht, The Netherlands, p.
- T. S. Cale, G. B. Raupp, B. R. Rogers, F. R. Meyers, T. E. Zirkle, in Plasma Processing of Semiconductors, P. F. Williams, Ed., NATO ASI Series, Kluwer Academic Publishers, Dordrecht, The Netherlands 1997, p. 89.
- (1997) Plasma Processing of Semiconductors , pp. 89
- Cale, T.S.¹ Raupp, G.B.² Rogers, B.R.³ Meyers, F.R.⁴ Zirkle, T.E.⁵

21
- 84866367222
- DOI: 10.1002/ppap.201100193.
- J. D. Whittle, D. A. Steele, R. D. Short, Plasma Process. Polym. DOI: 10.1002/ppap.201100193.
- Plasma Process. Polym.
- Whittle, J.D.¹ Steele, D.A.² Short, R.D.³

22
- 0004255148
- in, D. M. Manos, D. L. Flamm, Eds., Academic Press, Inc, San Diego.
- D. L. Flamm, in Plasma Etching, an Introduction, D. M. Manos, D. L. Flamm, Eds., Academic Press, Inc, San Diego 1989.
- (1989) Plasma Etching, An Introduction
- Flamm, D.L.¹

23
- 0036977861
- S. Sahli, S. Rebiai, P. Raynaud, Y. Segui, A. Zenasni, S. Mouissat, Plasmas Polym. 2002, 7, 327.
- (2002) Plasmas Polym. , vol.7 , pp. 327
- Sahli, S.¹ Rebiai, S.² Raynaud, P.³ Segui, Y.⁴ Zenasni, A.⁵ Mouissat, S.⁶

24
- 84866425277
- S. Béchu, O. Maulat, Y. Arnal, D. Vempaire, A. Lacoste, J. Pelletier, Surf. Coat. Technol. 2004, 186, 327.
- (2004) Surf. Coat. Technol. , vol.186 , pp. 327
- Béchu, S.¹ Maulat, O.² Arnal, Y.³ Vempaire, D.⁴ Lacoste, A.⁵ Pelletier, J.⁶

25
- 0041910688
- G. K. Vinogradov, Y. A. Ivanov, L. S. Polak, High Energy Chem. 1981, 15, 120.
- (1981) High Energy Chem. , vol.15 , pp. 120
- Vinogradov, G.K.¹ Ivanov, Y.A.² Polak, L.S.³

26
- 84866352035
- in, M. Shen, Ed., Dekker, New York, p.
- G. Smolinsky, M. J. Vasile, in Plasma Chemistry of Polymers, M. Shen, Ed., Dekker, New York 1976, p. 105.
- (1976) Plasma Chemistry of Polymers , pp. 105
- Smolinsky, G.¹ Vasile, M.J.²

27
- 0020719528
- R. d'Agostino, F. Cramarossa, V. Colaprico, R. d'Ettole, J. Appl. Phys. 1983, 54, 1284.
- (1983) J. Appl. Phys. , vol.54 , pp. 1284
- D'Agostino, R.¹ Cramarossa, F.² Colaprico, V.³ D'Ettole, R.⁴

28
- 0021389498
- R. d'Agostino, S. De Benedictis, F. Cramarossa, Plasma Chem. Plasma Process. 1984, 4, 1.
- (1984) Plasma Chem. Plasma Process. , vol.4 , pp. 1
- D'Agostino, R.¹ De Benedictis, S.² Cramarossa, F.³

29
- 0003551592
- in, R. d'Agostino, Ed., Academic Press, San Diego, USA.
- R. d'Agostino, F. Cramarossa, F. Fracassi, F. Illuzzi, in Plasma Polymerization of Fluorocarbons, in Plasma Deposition, Treatment, and Etching of Polymers, R. d'Agostino, Ed., Academic Press, San Diego, USA 1990.
- (1990) Plasma Polymerization of Fluorocarbons, in Plasma Deposition, Treatment, and Etching of Polymers
- D'Agostino, R.¹ Cramarossa, F.² Fracassi, F.³ Illuzzi, F.⁴

30
- 0001825554
- P. Favia, R. Lamendola, R. d'Agostino, Plasma Sources Sci. Technol. 1992, 1, 59.
- (1992) Plasma Sources Sci. Technol. , vol.1 , pp. 59
- Favia, P.¹ Lamendola, R.² D'Agostino, R.³

31
- 11144250529
- A. Milella, F. Palumbo, P. Favia, G. Cicala, R. d'Agostino, Plasma Process. Polym. 2004, 1, 164.
- (2004) Plasma Process. Polym. , vol.1 , pp. 164
- Milella, A.¹ Palumbo, F.² Favia, P.³ Cicala, G.⁴ D'Agostino, R.⁵

32
- 15244342655
- A. Milella, F. Palumbo, P. Favia, G. Cicala, R. d'Agostino, Pure Appl. Chem. 2005, 77, 399.
- (2005) Pure Appl. Chem. , vol.77 , pp. 399
- Milella, A.¹ Palumbo, F.² Favia, P.³ Cicala, G.⁴ D'Agostino, R.⁵

33
- 33748138977
- A. Bousquet, V. Bursikova, A. Goullet, A. Djouadi, L. Zajickova, A. Granier, Surf. Coat. Technol. 2006, 200, 6517.
- (2006) Surf. Coat. Technol. , vol.200 , pp. 6517
- Bousquet, A.¹ Bursikova, V.² Goullet, A.³ Djouadi, A.⁴ Zajickova, L.⁵ Granier, A.⁶

34
- 0003081880
- M. E. Ryan, A. M. Hynes, J. P. S. Badyal, Chem. Mater. 1996, 8, 37.
- (1996) Chem. Mater. , vol.8 , pp. 37
- Ryan, M.E.¹ Hynes, A.M.² Badyal, J.P.S.³

35
- 0030195863
- L. O'Toole, A. J. Beck, R. D. Short, Macromolecules 1996, 29, 5172.
- (1996) Macromolecules , vol.29 , pp. 5172
- O'Toole, L.¹ Beck, A.J.² Short, R.D.³

36
- 67651205746
- A. Francescangeli, F. Palumbo, R. d'Agostino, Plasma Process. Polym. 2009, 6, 132.
- (2009) Plasma Process. Polym. , vol.6 , pp. 132
- Francescangeli, A.¹ Palumbo, F.² D'Agostino, R.³

37
- 45849103167
- I. Swindells, S. A. Voronin, P. M. Bryant, M. R. Alexander, J. W. Bradley, J. Chem. B 2008, 112, 3938.
- (2008) J. Chem. B , vol.112 , pp. 3938
- Swindells, I.¹ Voronin, S.A.² Bryant, P.M.³ Alexander, M.R.⁴ Bradley, J.W.⁵

38
- 34247483518
- S. A. Voronin, M. Zelzer, C. Fotea, M. R. Alexander, J. W. Bradley, J. Phys. Chem. B 2007, 111, 3419.
- (2007) J. Phys. Chem. B , vol.111 , pp. 3419
- Voronin, S.A.¹ Zelzer, M.² Fotea, C.³ Alexander, M.R.⁴ Bradley, J.W.⁵

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.