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Applied Physics Letters

Volumn 102, Issue 23, 2013, Pages

Near-field characterization of chemical vapor deposition graphene in the microwave regime

(5) Katsounaros, Anestis a Cole, Matthew T b Tuncer, Hatice M b Milne, William I b Hao, Yang a

a QUEEN MARY UNIVERSITY OF LONDON (United Kingdom)

b UNIVERSITY OF CAMBRIDGE (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

AB INITIO SIMULATIONS; CHEMICAL VAPOR DEPOSITION GRAPHENE; ELECTRONIC PROPERTIES OF GRAPHENE; EMISSION CHARACTERISTICS; EMPIRICAL FINDINGS; MICROSTRIP TRANSMISSION LINES; NEAR-FIELD CHARACTERIZATIONS; NEAR-FIELD MEASUREMENT;

CHEMICAL VAPOR DEPOSITION; COPPER; ELECTRONIC PROPERTIES; MONOLAYERS;

GRAPHENE;

EID: 84879094028 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.4810759 Document Type: Article

Times cited : (17)

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