Retraction: Single cuprous oxide films synthesized by radical oxidation at low temperature for PV application (Optics Express (2013) 21:9 (11448-11456) DOI: 10.1364/OE.21.011448);Single cuprous oxide films synthesized by radical oxidation at low temperature for PV application

Optics Express

Volumn 21, Issue 9, 2013, Pages 11448-11456

  Zang, Zhigang ^a   Nakamura, Atsushi ^a   Temmyo, Jiro ^a  

^a SHIZUOKA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COPPER OXIDES; II-VI SEMICONDUCTORS; NITROGEN; NITROGEN PLASMA; OPEN CIRCUIT VOLTAGE; PLASMA APPLICATIONS; SAPPHIRE; TEMPERATURE; THIN FILMS; ZINC OXIDE;

HOLE DENSITIES; LOW TEMPERATURES; OPTICAL BAND GAP ENERGY; PLASMA TREATMENT; PV APPLICATIONS; RADICAL OXIDATION; RECTIFYING BEHAVIORS; X-RAY DIFFRACTION MEASUREMENTS;

OXIDE FILMS;

COPPER; CUPROUS OXIDE; FREE RADICAL; NANOPARTICLE; ARTIFICIAL MEMBRANE;

ARTICLE; ARTIFICIAL MEMBRANE; CHEMISTRY; CRYSTALLIZATION; MATERIALS TESTING; METHODOLOGY; OXIDATION REDUCTION REACTION; SEMICONDUCTOR; TEMPERATURE; PROCEDURES;

COPPER; CRYSTALLIZATION; FREE RADICALS; MATERIALS TESTING; MEMBRANES, ARTIFICIAL; NANOPARTICLES; OXIDATION-REDUCTION; SEMICONDUCTORS; TEMPERATURE;

EID: 84878594887     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.27.030449     Document Type: Erratum

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