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Volumn 311, Issue 17, 2009, Pages 4188-4192
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Heteroepitaxial growth of Cu2O thin film on ZnO by metal organic chemical vapor deposition
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Author keywords
A1. X ray diffraction; A3. Metal organic chemical vapor deposition; A3. Solid phase epitaxy; B1. Oxides; B2. Semiconducting materials; B3. Heterojunction semiconductor devices
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Indexed keywords
A1. X-RAY DIFFRACTION;
A3. METAL ORGANIC CHEMICAL VAPOR DEPOSITION;
A3. SOLID PHASE EPITAXY;
B1. OXIDES;
B2. SEMICONDUCTING MATERIALS;
B3. HETEROJUNCTION SEMICONDUCTOR DEVICES;
COPPER;
COPPER OXIDES;
DIFFRACTION;
DISTILLATION;
EPITAXIAL GROWTH;
INDUSTRIAL CHEMICALS;
METALLORGANIC CHEMICAL VAPOR DEPOSITION;
METALS;
ORGANIC CHEMICALS;
ORGANOMETALLICS;
OXIDE FILMS;
PHASE INTERFACES;
SEMICONDUCTING ZINC COMPOUNDS;
SEMICONDUCTOR DEVICE MANUFACTURE;
SEMICONDUCTOR GROWTH;
SEMICONDUCTOR JUNCTIONS;
SEMICONDUCTOR SWITCHES;
THIN FILMS;
VAPOR DEPOSITION;
VAPORS;
X RAY DIFFRACTION;
ZINC;
ZINC OXIDE;
DEPOSITION;
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EID: 68549135102
PISSN: 00220248
EISSN: None
Source Type: Journal
DOI: 10.1016/j.jcrysgro.2009.07.020 Document Type: Article |
Times cited : (102)
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References (22)
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