Layer-to-island growth of electrodeposited Cu2O films and filamentary switching in single-channeled grain boundaries

Journal of Applied Physics

Volumn 107, Issue 5, 2010, Pages

  Kang, Sung Oong ^a   Hong, Sahwan ^a   Choi, Jinsik ^a   Kim, Jin Soo ^a   Hwang, Inrok ^a   Byun, Ik Su ^a   Kim, Yeon Soo ^a   Kim, Wondong ^b   Park, Bae Ho ^a  

^a Konkuk University   (South Korea)

^b Korea Research Institute of Standards and Science   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALED FILMS; ANNEALING PROCESS; CHELATING AGENT; COLUMNAR GRAIN; CRITICAL THICKNESS; CUPROUS OXIDE; ELECTROCHEMICAL GROWTH; ELECTROCHEMICAL SOLUTIONS; GROWTH BEHAVIOR; GROWTH MODES; ISLAND GROWTH; ISLAND GROWTH MODE; MEMORY SWITCHING; MICROSTRUCTURE CHANGES; OHMIC CONDUCTION; PREFERRED ORIENTATIONS; RESISTIVE SWITCHING; SINGLE-CRYSTALLINE;

CHELATION; CRYSTALLINE MATERIALS; GRAIN BOUNDARIES; GRAIN SIZE AND SHAPE;

SWITCHING;

EID: 77949755033     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3310805     Document Type: Article

References (25)

1. R. Dong, D. S. Lee, W. F. Xiang, S. J. Oh, D. J. Seong, S. H. Heo, H. J. Choi, M. J. Kwon, S. N. Seo, M. B. Pyun, M. Hasan, and H. S. Hwang, Appl. Phys. Lett. 90, 042107 (2007).
2. W.-Y. Yang and S.-W. Rhee, Appl. Phys. Lett. 91, 232907 (2007).
3. A. Chen, S. Haddad, Y. C. Wu, T. N. Fang, S. Kaza, and Z. Lan, Appl. Phys. Lett. 92, 013503 (2008).
4. M. J. Rozenberg, I. H. Inoue, and M. J. Sánchez, Phys. Rev. Lett. 92, 178302 (2004).
5. M.-J. Lee, Y. S. Park, D.-S. Suh, E.-H. Lee, S. A. Seo, D.-C. Kim, R. J. Jung, B.-S. Kang, S.-E. Ahn, C. B. Lee, D. H. Seo, Y.-K. Cha, I.-K. Yoo, J.-S. Kim, and B. H. Park, Adv. Mater. 19, 3919 (2007).
6. T. Maruyama, Sol. Energy Mater. Sol. Cells 56, 85 (1998).
7. A. Kudo, H. Yanagi, H. Hosono, and H. Kawazoe, Appl. Phys. Lett. 73, 220 (1998).
8. Z. Q. Yu, C. M. Wang, M. H. Engelhard, P. Nachimuthu, D. E. McCready, I. V. Lyubinetsky, and S. Thevuthasan, Nanotechnology 18, 115601 (2007).
9. E. W. Bohannan, M. G. Shumsky, and J. A. Switzer, Chem. Mater. 11, 2289 (1999).
10. J. K. Barton, A. A. Vertegel, E. W. Bohannan, and J. A. Switzer, Chem. Mater. 13, 952 (2001).
11. J. A. Switzer, H. M. Kothari, and E. W. Bohannan, J. Phys. Chem. B 106, 4027 (2002).
12. R. Liu, E. A. Oba, F. Kulp, E. W. Bohannan, F. Ernst, and J. A. Switzer, Chem. Mater. 17, 725 (2005).
13. C. M. McShane and K.-Y. Choi, J. Am. Chem. Soc. 131, 2561 (2009).
14. S.-O. Kang, S. H. Hong, J. S. Choi, J.-S. Kim, I. R. Hwang, I.-S. Byun, K.-S. Yun, and B. H. Park, Appl. Phys. Lett. 95, 092108 (2009).
15. C. Rohde, B. J. Choi, D. S. Jeong, J.-S. Zhao, and C. S. Hwang, Appl. Phys. Lett. 86, 262907 (2005).
16. K. Kinoshita, T. Tamura, M. Aoki, Y. Sugiyama, and H. Tanaka, Appl. Phys. Lett. 89, 103509 (2006).
17. K. M. Kim, B. J. Choi, Y. C. Shin, S. Choi, and C. S. Hwang, Appl. Phys. Lett. 91, 012907 (2007).
18. J. Y. Son and Y.-H. Shin, Appl. Phys. Lett. 92, 222106 (2008).
19. D. C. Kim, S. Seo, S. E. Ahn, D.-S. Suh, M.-J. Lee, B.-H. Park, I. K. Yoo, I. G. Baek, H.-J. Kim, E. K. Yim, J. E. Lee, S. O. Park, H. S. Kim, U.-I. Chung, J. T. Moon, and B. I. Ryu, Appl. Phys. Lett. 88, 202102 (2006).
20. G.-S. Park, X.-S. Li, D.-C. Kim, R.-J. Jung, M.-J. Lee, and S. Seo, Appl. Phys. Lett. 91, 222103 (2007).
21. J. G. Strom and H. W. Jun, J. Pharm. Sci. 69, 1261 (1980).
22. ICDD Card No. 78-2076.
23. C. D. Wagner, W. M. Riggs, L. E. Davis, J. E. Moulder, and G. E. Muilenber, Handbook of X-Ray Photoelectron Spectroscopy (Perkin Elmer Corporation Physical Electronics Division, Eden Prairie, 1979).
24. W. Wenzhong, W. Guanghou, W. Xiaoshu, Z. Yongjie, L. Yingkai, and Z. Changlin, Adv. Mater. 14, 67 (2002).
25. H. Shima, F. Takano, and H. Akinaga, Appl. Phys. Lett. 91, 012901 (2007).