22 nm node wafer inspection using diffraction phase microscopy and image post-processing

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 8681, Issue , 2013, Pages

  Zhou, Renjie ^a   Popescu, Gabriel ^a   Goddard, Lynford L ^a  

^a University of Illinois at Urbana Champaign   (United States)

Author keywords

Image processing; Interference microscope; Phase imaging; Signal to noise ratio; Wafer defect inspection

Indexed keywords

DEFECT INSPECTION; EPI-ILLUMINATION; IMAGING PROCESSING; INTERFERENCE MICROSCOPES; PARALLEL BRIDGES; PHASE IMAGING; SYSTEM CALIBRATION; WAFER INSPECTION;

DEFECTS; DIFFRACTION; IMAGE PROCESSING; MICROSCOPES; NANOTECHNOLOGY; PROCESS CONTROL; SIGNAL TO NOISE RATIO; UNITS OF MEASUREMENT;

INSPECTION;

EID: 84878580937     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.2011216     Document Type: Conference Paper

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