Diffraction phase microscopy for wafer inspection

2012 IEEE Photonics Conference, IPC 2012

Volumn , Issue , 2012, Pages 644-645

  Zhou, Renjie ^a   Edwards, Chris ^a   Popescu, Gabriel ^a   Goddard, Lynford L ^a  

^a University of Illinois at Urbana Champaign   (United States)

Author keywords

diffraction; microscope; phase microscope; wafer inspection

Indexed keywords

BURIED DEFECT; COMMON PATH; DEFECT DETECTION; EPI-ILLUMINATION; SEMI-CONDUCTOR WAFER; WAFER INSPECTION;

MICROSCOPES; PHOTONICS;

DIFFRACTION;

EID: 84871788001     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/IPCon.2012.6358786     Document Type: Conference Paper

References (5)

1. R. M. Silver, B. M. Barnes, Y. Sohn, R. Quintanilha, H. Zhou, C. Deeb, M. Johnson, M. Goodwin, and D. Patel, "The limits and extensibility of optical patterned defect inspection", Proc. SPIE 7638, 76380J (2010).
2. C. E. Thomas Jr., T. M. Bahm, L. R. Baylor, P. R. Bingham, S. W. Burns, M. D. Chidley, X. Dai, et al., "Direct to digital holography for semiconductor wafer defect detection and review", Proc. SPIE 4692, 180 (2002).
3. G. Popescu, T. Ikeda, R. R. Dasari, and M. S. Feld, "Diffraction phase microscopy for quantifying cell structure and dynamics," Opt. Lett. 31, 775-777 (2006).
4. Y. K. Park, G. Popescu, R. R. Dasari, K. Badizadegan and M. S. Feld, "Fresnel particle tracking in three dimensions using diffraction phase microscopy", Opt. Lett., 32, 811 (2007).
5. C. Edwards, A. Arbabi, G. Popescu, and L. Goddard, "Optically monitoring and controlling nanoscale topography during semiconductor etching," submitted for publication (2012).