Highly performing Al:ZnO thin films grown by pulsed laser deposition at room temperature

Nanoscience and Nanotechnology Letters

Volumn 5, Issue 4, 2013, Pages 484-486

  Gondoni, P ^a   Ghidelli, M ^a   Di Fonzo, F ^b   Russo, V ^a   Bruno, P ^b   Marti Rujas J ^b   Bottani, C E ^a,b   Li Bassi, A ^a,b   Casari, C S ^a,b  

^a POLITECNICO DI MILANO   (Italy)

^b ISTITUTO ITALIANO DI TECNOLOGIA   (Italy)

Author keywords

Photovoltaics; Pulsed laser deposition; Room temperature deposition; Transparent conducting oxide; Zinc oxide

Indexed keywords

ELECTRICAL MEASUREMENT; FLEXIBLE ELECTRODES; FUNCTIONAL PROPERTIES; OPTOELECTRONIC APPLICATIONS; PHOTOVOLTAICS; ROOM TEMPERATURE DEPOSITION; TRANSMITTANCE SPECTRA; TRANSPARENT CONDUCTING OXIDE;

ELECTRIC PROPERTIES; INDIUM; METALLIC FILMS; OPTICAL FILMS; OPTOELECTRONIC DEVICES; SCANNING ELECTRON MICROSCOPY; X RAY DIFFRACTION; ZINC OXIDE;

PULSED LASER DEPOSITION;

EID: 84877738180     PISSN: 19414900     EISSN: 19414919     Source Type: Journal    
DOI: 10.1166/nnl.2013.1561     Document Type: Conference Paper

References (21)

1. C. G. Granqvist, Sol. Energy Mater. Sol. Cells 91, 1529 (2007).
2. E. Fortunato, D. Ginley, H. Hosono, and D. C. Paine, MRS Bull. 32, 242 (2007).
3. D. S. Ginley and C. Bright, MRS Bull. 25, 15 (2000).
4. G. Exarhos and X. Zhou, Thin Solid Films 515, 7025 (2007).
5. T. Minami, Thin Solid Films 516, 1314 (2008).
6. Ü. Özgür, Ya I. Alivov, C. Liu, A. Teke, M. A. Reshchikov, S. Doǧan, V. Avrutin, S.-J. Cho, and H. Morcoç J. Appl. Phys. 98, 1 (2005).
7. S. Logothetidis, A. Laskarakis, and S. Kassavetis, Thin Solid Films 516, 1345 (2008).
8. H. Agura, A. Suzuki, T. Matsushita, T. Aoki, and M. Okuda, Thin Solid Films 445, 263 (2003).
9. N. Brilis, D. Tsamakis, H. Ali, S. Krishnamoorthy, and A. A. Iliadis, Thin Solid Films 516, 4226 (2008).
10. H. Tanaka, K. Ihara, T. Miyata, H. Sato, and T. Minami, J. Vac. Sci. Technol. A 22, 1757 (2004).
11. A. Suzuki, M. Nakamura, R. Michihata, and T. Aoki, Thin Solid Films 517, 1478 (2008).
12. R. K. Shukla, A. Srivastava, A. Srivastava, and K. C. Dubey, J. Cryst. Growth 294, 427 (2006).
13. H. Kim, J. S. Horwitz, S. B. Qadri, and D. B. Chrisey, Thin Solid Films 421, 107 (2002).
14. J. Lackner, Thin Solid Films 494, 302 (2006).
15. N. Sakai, Y. Umeda, F. Mitsugi, and T. Ikegami, Surf. Coat. Tech. 202, 5467 (2008).
16. P. Gondoni, M. Ghidelli, F. Di Fonzo, V. Russo, P. Bruno, J. Martí-Rujas, A. L. Bassi, C. E. Bottani, and C. S. Casari, Thin Solid Films 520, 4707 (2012).
17. T. Minami, Semicond. Sci. Technol. 20, 35 (2005).
18. T. Minami, T. Miyata, Y. Ohtani, and T. Kuboi, Phys. Status Solidi-R 1, R31 (2007).
19. B.-Z. Dong, G.-J. Fang, J.-F. Wang, W.-J. Guan, and X.-Z. Zhao, J. Appl. Phys. 101, 033713 (2007).
20. J. Kim, S. Lee, J. Bae, S. Park, U. Choi, and C. Cho, Thin Solid Films 516, 5223 (2008).
21. P. Gondoni, M. Ghidelli, F. Di Fonzo, M. Carminati, V. Russo, A. L. Bassi, and C. S. Casari, Nanotechnology 23, 365706 (2012).