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Volumn 517, Issue 4, 2008, Pages 1478-1481
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Ultrathin Al-doped transparent conducting zinc oxide films fabricated by pulsed laser deposition
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Author keywords
Al doped transparent conducting zinc oxide; Pulsed laser deposition; Transparent conducting oxide; Ultrathin film
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Indexed keywords
ALUMINUM;
BIOACTIVITY;
CARRIER CONCENTRATION;
CIVIL AVIATION;
CONCENTRATION (PROCESS);
CONDUCTIVE FILMS;
DIFFRACTION;
EMISSION SPECTROSCOPY;
EXCIMER LASERS;
FIELD EMISSION;
GALVANOMAGNETIC EFFECTS;
GAS LASERS;
HALL EFFECT;
HALL MOBILITY;
LASERS;
LIGHT;
MAGNETIC FIELD EFFECTS;
MAGNETIC FILMS;
MICROSCOPIC EXAMINATION;
OPTICAL FILMS;
OXIDES;
PULSED LASER APPLICATIONS;
PULSED LASER DEPOSITION;
SUBSTRATES;
THICK FILMS;
ULTRATHIN FILMS;
X RAY ANALYSIS;
ZINC;
ZINC OXIDE;
AL-DOPED TRANSPARENT CONDUCTING ZINC OXIDE;
ARF EXCIMER LASERS;
ATOMIC FORCES;
AZO FILMS;
DIFFRACTION PEAKS;
FIELD EMISSION SCANNING ELECTRON MICROSCOPIES;
GLASS SUBSTRATES;
ISLAND STRUCTURES;
LOW RESISTIVITIES;
PULSED LASERS;
SUBSTRATE TEMPERATURES;
TRANSPARENT CONDUCTING;
TRANSPARENT CONDUCTING OXIDE;
VISIBLE LIGHTS;
VOID SPACES;
X-RAY DIFFRACTIONS;
ZINC OXIDE FILMS;
OXIDE FILMS;
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EID: 56949104029
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/j.tsf.2008.09.024 Document Type: Article |
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Times cited : (39)
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References (5)
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