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Volumn 66, Issue 1, 2013, Pages 38-42

Frequency dependent ferroelectric and electrical properties of (Ho, Ni) co-doped BiFeO3 thin films

Author keywords

BiFeO3 thin film; Frequency dependence; Hysteresis loops; Leakage current density

Indexed keywords

CHEMICAL SOLUTION DEPOSITION METHOD; CO-DOPED; COERCIVE ELECTRIC FIELD; FREQUENCY DEPENDENCE; FREQUENCY DEPENDENT; MEASUREMENT FREQUENCY; PT(111); REMNANT POLARIZATIONS;

EID: 84877584189     PISSN: 09280707     EISSN: None     Source Type: Journal    
DOI: 10.1007/s10971-013-2963-3     Document Type: Article
Times cited : (7)

References (17)
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    • Prellier W, Singh MP, Murugavel P (2005) The single-phase multiferroic oxides: from bulk to thin film. J Phys Condens Matter 17:R803-R832
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    • Prellier, W.1    Singh, M.P.2    Murugavel, P.3
  • 4
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    • 10.1016/j.mser.2010.03.001
    • Martin LW, Chu YH, Ramesh R (2010) Advances in the growth and characterization of magnetic, ferroelectric, and multiferroic oxide thin films. Mater Sci Eng R 68:89-113
    • (2010) Mater Sci Eng R , vol.68 , pp. 89-113
    • Martin, L.W.1    Chu, Y.H.2    Ramesh, R.3
  • 6
    • 55149125825 scopus 로고    scopus 로고
    • 3 film capacitor with suppressed leakage current by Nd and Mn cosubstitution and their ferroelectric properties
    • 10.1143/JJAP.47.7586 1:CAS:528:DC%2BD1cXht1ynsr3M
    • 3 film capacitor with suppressed leakage current by Nd and Mn cosubstitution and their ferroelectric properties. Jpn J Appl Phys 47:7586-7589
    • (2008) Jpn J Appl Phys , vol.47 , pp. 7586-7589
    • Kawae, T.1    Tsuda, H.2    Naganuma, H.3    Yamada, S.4    Kumeda, M.5    Okamura, S.6    Morimoto, A.7
  • 12
    • 84944648082 scopus 로고
    • Revised effective ionic radii and systematic studies of interatomic distances in halides and chalcogenides
    • Shannon RD (1975) Revised effective ionic radii and systematic studies of interatomic distances in halides and chalcogenides. Acta Cryst A32:751-767
    • (1975) Acta Cryst , vol.32 , pp. 751-767
    • Shannon, R.D.1
  • 17
    • 36849052828 scopus 로고    scopus 로고
    • 3 thin films prepared using metal organic decomposition
    • 10.1063/1.2822826
    • 3 thin films prepared using metal organic decomposition. Appl Phys Lett 91:232909
    • (2007) Appl Phys Lett , vol.91 , pp. 232909
    • Hu, G.D.1    Cheng, X.2    Wu, W.B.3    Yang, C.H.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.