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Journal of Applied Physics

Volumn 113, Issue 16, 2013, Pages

Evidence for boron diffusion into sub-stoichiometric MgO (001) barriers in CoFeB/MgO-based magnetic tunnel junctions

(6) Harnchana, V a,c Hindmarch, A T a,d Sarahan, M C b Marrows, C H a Brown, A P a Brydson, R M D a

a UNIVERSITY OF LEEDS (United Kingdom)

b DARESBURY LABORATORY (United Kingdom)

c Khon Kaen University (Thailand)

d DURHAM UNIVERSITY (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ANALYTICAL SCANNING-TRANSMISSION ELECTRON MICROSCOPIES; ANNEALED STRUCTURE; ANNEALING TEMPERATURES; BOTTOM ELECTRODES; DEFECTIVE STRUCTURES; DEVICE PERFORMANCE; MAGNETIC TUNNEL JUNCTION; PARTIAL CRYSTALLIZATION;

BORON; COBALT COMPOUNDS; DEPOSITS; DIFFUSION IN SOLIDS; MAGNETIC DEVICES; PHOTOELECTRONS; TRANSMISSION ELECTRON MICROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

MAGNESIA;

EID: 84877301439 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.4802692 Document Type: Article

Times cited : (21)

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