Surface patterning by local plasma jet sacrificial oxidation of silicon

Plasma Processes and Polymers

Volumn 10, Issue 5, 2013, Pages 416-421

  Paetzelt, Hendrik ^a   Arnold, Thomas ^a   Böhm, Georg ^a   Pietag, Fred ^a   Schindler, Axel ^a  

^a LEIBNIZ INSTITUTE OF SURFACE ENGINEERING IOM   (Germany)

Author keywords

plasma jet, silicon oxides; surface modification; thin films

Indexed keywords

ATOMIC FORCE MICROSCOPE (AFM); CHEMICAL REMOVALS; COMPOSITIONAL ANALYSIS; OXIDE LAYER THICKNESS; SACRIFICIAL OXIDATION; SECONDARY ION MASS SPECTROSCOPIES (SIMS); SURFACE PATTERNING; WORKING DISTANCES;

ATMOSPHERIC PRESSURE; ATOMIC FORCE MICROSCOPY; OXIDATION; PLASMA JETS; REFRACTIVE INDEX; SECONDARY ION MASS SPECTROMETRY; SPECTROSCOPIC ELLIPSOMETRY; SURFACE ROUGHNESS; SURFACE TREATMENT; THIN FILMS; WET ETCHING;

SILICON OXIDES;

EID: 84877299267     PISSN: 16128850     EISSN: 16128869     Source Type: Journal    
DOI: 10.1002/ppap.201200099     Document Type: Article

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