Ion beam and plasma jet etching for optical component fabrication

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4440, Issue , 2001, Pages 217-227

  Schindler, Axel ^a   Haensel, Thomas ^a   Flamm, Dieter ^a   Frank, Wilfried ^a   Boehm, Georg ^a   Frost, Frank ^a   Fechner, Renate ^a   Bigl, Frieder ^a   Rauschenbach, Bernd ^a  

^a LEIBNIZ INSTITUTE OF SURFACE ENGINEERING IOM   (Germany)

Author keywords

Ion beam figuring; Microoptics fabrication; Nanometer precision optics; Plasma jet etching; Proportional pattern transfer

Indexed keywords

ALGORITHMS; MACHINING; MASKS; MICROOPTICS; NANOSTRUCTURED MATERIALS; PHOTORESISTS; PLASMA JETS; REACTIVE ION ETCHING; RESEARCH AND DEVELOPMENT MANAGEMENT; SURFACE ROUGHNESS;

NANOMETER PRECISION OPTICS;

OPTOELECTRONIC DEVICES;

EID: 0035759288     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.448043     Document Type: Conference Paper

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