Continuous equilibrated growth of ordered block copolymer thin films by electrospray deposition

ACS Nano

Volumn 7, Issue 4, 2013, Pages 2960-2970

  Hu, Hanqiong ^a   Rangou, Sofia ^b,c   Kim, Myungwoong ^d   Gopalan, Padma ^d   Filiz, Volkan ^c   Avgeropoulos, Apostolos ^b   Osuji, Chinedum O ^a  

^a Yale University   (United States)

^b UNIVERSITY OF IOANNINA   (Greece)

^c INSTITUTE OF MATERIALS RESEARCH   (Germany)

^d University of Wisconsin Madison   (United States)

Author keywords

block copolymer; electrospray; film growth; self assembly; thin films

Indexed keywords

BLOCK COPOLYMER FILMS; BLOCK COPOLYMER THIN FILMS; ELECTROSPRAY DEPOSITION; ELECTROSPRAYS; POLY(STYRENE-B-ETHYLENE OXIDE); SOLVENT SELECTIVITY; SUBSTRATE TEMPERATURE; TEMPERATURE WINDOW;

ACETONE; BLOCK COPOLYMERS; CYLINDERS (SHAPES); DEPOSITION; ESTERS; FILM GROWTH; FLOW RATE; MORPHOLOGY; SELF ASSEMBLY; STYRENE; SUBSTRATES; THIN FILMS; VAPOR DEPOSITION; VAPORS;

INTERFACES (MATERIALS);

MACROGOL DERIVATIVE; NANOMATERIAL; POLYSTYRENE DERIVATIVE;

ARTICLE; ARTIFICIAL MEMBRANE; CHEMISTRY; CONFORMATION; CRYSTALLIZATION; ELECTROPLATING INDUSTRY; GAS; MACROMOLECULE; MATERIALS TESTING; METHODOLOGY; PARTICLE SIZE; SURFACE PROPERTY; ULTRASTRUCTURE;

CRYSTALLIZATION; ELECTROPLATING; GASES; MACROMOLECULAR SUBSTANCES; MATERIALS TESTING; MEMBRANES, ARTIFICIAL; MOLECULAR CONFORMATION; NANOSTRUCTURES; PARTICLE SIZE; POLYETHYLENE GLYCOLS; POLYSTYRENES; SURFACE PROPERTIES;

EID: 84876519269     PISSN: 19360851     EISSN: 1936086X     Source Type: Journal    
DOI: 10.1021/nn400279a     Document Type: Article

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