Process parameters for fast production of ultra-thin polymer film with electrospray deposition under ambient conditions

Journal of Colloid and Interface Science

Volumn 339, Issue 2, 2009, Pages 481-488

  Rietveld, Ivo B ^a   Kobayashi, Kei ^a   Yamada, Hirofumi ^a   Matsushige, Kazumi ^a  

^a KYOTO UNIVERSITY   (Japan)

Author keywords

Electrostatic spray deposition; Morphology control; Nanotechnology; Poly(vinylidene fluoride); Thin films

Indexed keywords

AMBIENT CONDITIONS; CONCENTRATION THRESHOLD; CONTINUOUS FILMS; DROPLET SIZES; ELECTROSPRAY DEPOSITION; ELECTROSPRAYS; ELECTROSTATIC SPRAY DEPOSITION; FILM QUALITY; FILM SMOOTHNESS; MORPHOLOGY CONTROL; POLY(VINYLIDENE FLUORIDE); POLYMER CONCENTRATIONS; PROCESS PARAMETERS; SHEAR RATES; SUBSTRATE SURFACE; ULTRA-THIN POLYMER FILMS; VOLUME FLUX; WETTING BEHAVIOR;

DEPOSITS; DROP FORMATION; ELECTROSTATICS; MORPHOLOGY; NANOTECHNOLOGY; POLYMERS; SHEAR DEFORMATION; STRONTIUM COMPOUNDS; SUBSTRATES; THIN FILM DEVICES; THIN FILMS; WETTING;

POLYMER FILMS;

POLYMER; POLYVINYLIDENE FLUORIDE; SOLVENT;

ADHESION; ANALYTIC METHOD; ARTICLE; ELECTROSPRAY; EVAPORATION; FILM; PRIORITY JOURNAL; SHEAR RATE; THICKNESS; WETTABILITY;

EID: 70349529809     PISSN: 00219797     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcis.2009.08.004     Document Type: Article

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