Tribological and stability investigations of alkylphosphonic acids on alumina surface

Applied Surface Science

Volumn 273, Issue , 2013, Pages 570-577

  Cichomski, M ^a   Kosla K ^a   Grobelny, J ^a   Kozlowski W ^a   Szmaja, W ^a  

^a UNIVERSITY OF LODZ   (Poland)

Author keywords

Alkylphosphonic acids; Alumina surface; Fourier transform infrared spectroscopy; Time of flight secondary ion mass spectrometry; Tribology; X ray photoelectron spectroscopy

Indexed keywords

ALUMINA; ALUMINUM OXIDE; FOURIER TRANSFORM INFRARED SPECTROSCOPY; FRICTION; NITRIDES; PHOTOELECTRONS; PHOTONS; SECONDARY EMISSION; SECONDARY ION MASS SPECTROMETRY; SELF ASSEMBLED MONOLAYERS; SILICON NITRIDE; SURFACE TREATMENT; TRIBOLOGY; ZIRCONIA;

ALKYLPHOSPHONIC ACIDS; ALUMINA SURFACE; COEFFICIENT OF FRICTIONS; ENVIRONMENTAL CONDITIONS; LIQUID PHASE DEPOSITION METHOD; OCTADECYLPHOSPHONIC ACIDS; TIME OF FLIGHT SECONDARY ION MASS SPECTROMETRY; WATER CONTACT ANGLE MEASUREMENT;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 84876413645     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2013.02.081     Document Type: Article

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