Formation kinetics and stability of phosphonate self-assembled monolayers on indium-tin oxide

Electrochimica Acta

Volumn 56, Issue 13, 2011, Pages 4828-4833

  Jo, Kyungmin ^a   Yu, Hua Zhong ^b   Yang, Haesik ^a  

^a Pusan National University   (South Korea)

^b SIMON FRASER UNIVERSITY   (Canada)

Author keywords

Formation kinetics; Indium tin oxide; Phosphonic acid; Self assembled monolayer; Stability

Indexed keywords

AMBIENT AIR CONDITIONS; CHARGE TRANSFER RESISTANCE; DEPOSITION SOLUTION; ELECTROCHEMICAL IMPEDANCE; ELECTROCHEMICAL STUDIES; EXPERIMENTAL DATA; FORMATION KINETICS; FORMATION RATES; INCUBATION TIME; INDIUM TIN OXIDE ELECTRODES; INDIUM-TIN OXIDE; ITO ELECTRODES; LANGMUIR ADSORPTION MODEL; PBS SOLUTION; PHOSPHATE-BUFFERED SALINES; PHOSPHONATES; PHOSPHONIC ACIDS; PURE WATER; REDOX INDICATOR; SAMS; SURFACE COVERAGES; SURFACE MODIFICATION; THIOLATES; VOLTAMMETRIC;

ADSORPTION; CHARGE TRANSFER; ELECTROCHEMICAL CORROSION; ELECTROCHEMICAL ELECTRODES; ELECTRON ENERGY LEVELS; GOLD COATINGS; INDIUM; KINETICS; ORGANIC ACIDS; ORGANIC POLYMERS; RATE CONSTANTS; SALINE WATER; STABILITY; TIN; TIN OXIDES;

SELF ASSEMBLED MONOLAYERS;

EID: 79955852343     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.electacta.2011.03.021     Document Type: Article

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