"double exposure method": A novel photolithographic process to fabricate flexible organic field-effect transistors and circuits

ACS Applied Materials and Interfaces

Volumn 5, Issue 7, 2013, Pages 2316-2319

  Ji, Deyang ^a   Jiang, Lang ^a   Dong, Huanli ^a   Meng, Qing ^a   Wang, Zongrui ^a   Zhang, Hantang ^a   Hu, Wenping ^a  

^a INSTITUTE OF CHEMISTRY   (China)

Author keywords

double exposure; flexible; OFETs; organic circuits; polystyrene

Indexed keywords

ANNEALING TEMPERATURES; DOUBLE EXPOSURE; FLEXIBLE; FLEXIBLE ORGANIC ELECTRONICS; OFETS; ORGANIC CIRCUITS; ORGANIC DIELECTRIC LAYERS; PHOTOLITHOGRAPHIC PROCESS;

ACETONE; ORGANIC FIELD EFFECT TRANSISTORS; POLYSTYRENES;

PHOTOLITHOGRAPHY;

EID: 84876145013     PISSN: 19448244     EISSN: 19448252     Source Type: Journal    
DOI: 10.1021/am302684k     Document Type: Article

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