Highly uniform 2d growth, substrate transfer, and electrical characterization of electrodeposited ZNO thin films

Journal of the Electrochemical Society

Volumn 160, Issue 6, 2013, Pages

  Thomas, M A ^a,b   Cuia, J B ^a  

^a University of Arkansas at Little Rock ^*  (United States)

^b STETSON UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DEVICE APPLICATION; ELECTRICAL CHARACTERIZATION; ELECTRICAL MEASUREMENT; ELECTROCHEMICAL PROCESS; ELECTROCHEMICAL REACTIONS; HALL EFFECT MEASUREMENT; NUCLEATION PROCESS; SUBSTRATE TRANSFER;

CONDUCTIVE FILMS; CYCLIC VOLTAMMETRY; ELECTROCHEMISTRY; ELECTRODEPOSITION; METALLIC FILMS; METHANOL; NITRATES; OPTICAL FILMS; ZINC; ZINC OXIDE;

ELECTRIC PROPERTIES;

EID: 84875686098     PISSN: 00134651     EISSN: 19457111     Source Type: Journal    
DOI: 10.1149/2.080306jes     Document Type: Article

References (41)

1. D. Lincot, MRS Bull., 35, 778 (2010).
2. L. Schmidt-Mende and J. L. MacManus-Driscoll, Mater. Today, 10, 40 (2007).
3. S. K. Mandal, A. K. Das, T. K. Nath, and D. J. Karmakar, Appl. Phys. Lett., 89, 144105 (2006).
4. S. B. Zhang, S.-H. Wei, and Y. F. Yan, Physica B, 302, 135 (2001).
5. C. H. Park, S. B. Zhang, and S.-H. Wei, Phys. Rev. B, 66, 073202 (2002).
6. J. Li, S.-H. Wei, S. S. Li, and J. B. Xia, Phys. Rev. B, 74, 081201 (2006).
7. J. B. Cui and U. J. Gibson, Appl. Phys. Lett., 87, 133108 (2005).
8. M. A. Thomas and J. B. Cui, J. Phys. Chem. Lett., 1, 1090 (2010).
9. J. Rousset, F. Donsanti, P. Genevee, G. Renou, and D. Lincot, Sol. Energy Mat. Sol. Cells, 95, 1544 (2011).
10. O. Lupan, T. Pauporte, T. La Bahers, B. Viana, and I. Ciofini, Adv. Func. Mater., 21, 3564 (2011).
11. M. Izaki and T. Omi, Appl. Phys. Lett., 68, 2439 (1996).
12. S. Peulon and D. Lincot, Adv. Mater., 8, 166 (1996).
13. S. Peulon and D. Lincot, J. Electrochem. Soc., 145, 864 (1998).
14. S. Chatman, L. Emberley, and K. M Poduska, ACS Appl. Mater. Interfaces, 1, 2348 (2009).
15. M. Izaki, J. Electrochem. Soc., 146, 4517 (1999).
16. L. S. Zhang, Z. G. Chen, Y. W. Tang, and Z. J. Jia, Thin Solid Films, 492, 24 (2005).
17. K. Y. Wu, Z. Q. Sun, and J. B. Cui, Cryst. Growth Des., 12, 2864 (2012).
18. J. A. von Windheim, H. Wynands, and M. Cocivera, J. Electrochem. Soc., 138, 3435 (1991).
19. J. F. Guillemoles, P. Cowache, A. Lusson, K. Fezzaa, F. Boisivon, J. Videl, and D. Lincot, J. Appl. Phys., 79, 7293 (1996).
20. K. Mizuno, M. Izaki, K. Murase, T. Shinagawa, M. Chigane, M. Inaba, A. Tasaka, and Y. Awakura, J. Electrochem. Soc., 152, C179 (2005).
21. S. Yoon, I. Huh, J. H. Lim, and B. Yoo, Curr. Appl. Phys., 12, 784 (2012).
22. T. Shinagawa, M. Chigane, K. Murase, and M. Izaki, J. Phys. Chem. C, 116 15925 (2012).
23. I. Mora-Sero, F. Fabregat-Santiago, B. Denier, J. Bisquert, R. Tena-Zaera, J. Elias, and C. Levy-Clement, Appl. Phys. Lett., 89, 203117 (2006).
24. A. Ashida, A. Fujita, Y. G. Shim, K.Wakita, and A. Nakahira, Thin Solid Films, 517, 1461 (2008).
25. J. Rousset, E. Saucedo, and D. Lincot, Chem. Mater., 21, 534 (2009).
26. C. V. Manzano, D. Alegre, O. Caballero-Calero, B. Alen, andM. S.Martin-Gonzalez, J. Appl. Phys., 110, 043538 (2011).
27. T. Yoshida, D. Komatsu, N. Shimokawa, and H. Minoura, Thin Solid Films, 451, 166 (2004).
28. K. M. McPeak, M. A. Becker, N. G. Britton, H. Majidi, B. A. Bunker, and J. B. Baxter, Chem. Mater., 22, 6162 (2010).
29. L. Heerman and A. Tarallo, J. Electroanal. Chem., 470, 70 (1999).
30. J. A. Cox and A. Brajter, Electrochem. Acta, 24, 517 (1979).
31. N. Ogawa and S. Ikeda, Anal. Sci., 7(Suppl), 1681 (1991).
32. K. M. McPeak, T. P. Le, N. G. Britton, Z. S. Nicholov, Y. A. Elabd, and J. B. Baxter, Langmuir, 27, 3672 (2011).
33. D. Andeen, J. H. Kim, F. F. Lange, G. K. L. Goh, and S. Tripathy, Adv. Func. Mater., 16, 799 (2006).
34. B. Cheng and E. T. Samulski, Chem. Commun. 8, 986 (2004).
35. Z. F. Li and A. I. Popov, J. Solution Chem., 11, 17 (1982).
36. K. P. Musselman, T. Gershon, L. Schmidt-Mende, and J. L. MacManus-Driscoll, Electrochim. Acta, 56, 3758 (2011).
37. A. Janotti and C. G. Van de Walle, Phys. Rev. B, 76, 165202 (2007).
38. Y. J. Kim and H. J. Kim, Mater. Lett., 41, 159 (1999).
39. A. Kronenberger, A. Polity, D. M. Hofmann, B. K. Meyer, A. Schleife, and F. Bechstedt, Phys. Rev. B, 86, 115334 (2012).
40. D. C. Look, D. C. Reynolds, C. W. Litton, R. L. Jones, D. B. Eason, and G. Cantwell, Appl. Phys. Lett., 81, 1830 (2002).
41. E. M. Kaidashev, M. Lorenz, H. von Wenckstern, A. Rahm, H. C. Semmelhack, K. H. Han, G. Benndorf, C. Bundesmann, H. Hochmuth, and M. Grundmann, Appl. Phys. Lett., 82, 3901 (2003).