ZnO thin films epitaxially grown by electrochemical deposition method with constant current

Thin Solid Films

Volumn 517, Issue 4, 2008, Pages 1461-1464

  Ashida, Atsushi ^a   Fujita, Akio ^a   Shim, Yonggu ^a   Wakita, Kazuki ^b   Nakahira, Atsushi ^a  

^a Osaka Prefecture University   (Japan)

^b CHIBA INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Constant current; Electrochemical deposition; Epitaxial growth; Zinc oxide

Indexed keywords

CORUNDUM; DEPOSITION; ELECTROCHEMICAL SENSORS; ELECTROCHROMIC DEVICES; ELECTROOPTICAL DEVICES; EPITAXIAL GROWTH; GOLD; LITHIUM BATTERIES; METALLIC FILMS; MOLECULAR BEAM EPITAXY; OPTICAL FILMS; PLATINUM; REDUCTION; SEMICONDUCTING ZINC COMPOUNDS; SUBSTRATES; THICK FILMS; THIN FILMS; X RAY ANALYSIS; X RAY DIFFRACTION ANALYSIS; ZINC; ZINC ALLOYS; ZINC OXIDE;

AU SUBSTRATES; CATHODIC CURRENT DENSITIES; CONSTANT CURRENT; CONSTANT CURRENTS; CRYSTALLINITY; DEPOSITED FILMS; ELECTROCHEMICAL DEPOSITION; ELECTROCHEMICAL DEPOSITIONS; EPITAXIALLY GROWN; PLANE DIRECTIONS; PLANE ORIENTATIONS; POLYCRYSTAL LINES; SIZE AND SHAPES; SUBSTRATE LAYERS; X-RAY DIFFRACTIONS; XRD MEASUREMENTS; ZNO FILMS; ZNO THIN FILMS;

FILM PREPARATION;

EID: 56949098746     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2008.09.006     Document Type: Article

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