Modeling the reactive sputter deposition of N-doped TiO 2 for application in dye-sensitized solar cells: Effect of the O 2 flow rate on the substitutional N concentration

Applied Surface Science

Volumn 269, Issue , 2013, Pages 55-59

  Duarte, D A ^a   Sagas J C ^a   Da Silva Sobrinho, A S ^a   Massi, M ^a,b  

^a INSTITUTO TECNOLÓGICO DE AERONÁUTICA   (Brazil)

^b FEDERAL UNIVERSITY OF SÃO PAULO   (Brazil)

Author keywords

Berg model; Dye sensitized solar cells; Reactive sputter deposition

Indexed keywords

BACKSCATTERING; DOPING (ADDITIVES); NUMERICAL MODELS; REACTIVE SPUTTERING; SOLAR CELLS; TITANIUM DIOXIDE; X RAY PHOTOELECTRON SPECTROSCOPY;

BERG MODEL; CHEMICAL COMPOSITIONS; GROWTH MECHANISMS; N-DOPED; NUMERICAL APPROACHES; OPTICAL SPECTROPHOTOMETRY; REACTIVE GAS MIXTURES; RUTHERFORD BACK-SCATTERING;

DYE-SENSITIZED SOLAR CELLS;

EID: 84875452645     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2012.10.048     Document Type: Conference Paper

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