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Volumn 56, Issue 4, 2012, Pages

Dielectric patterning using aerosol jet printing

Author keywords

[No Author keywords available]

Indexed keywords

AEROSOL JET PRINTINGS; DIELECTRIC LAYER; DIELECTRIC PATTERNING; ETCHING PROCESS; PHOTOVOLTAIC APPLICATIONS; PROCESSING PARAMETERS; SELECTIVE ETCHING; SOLAR CELL DESIGN;

EID: 84875412275     PISSN: 10623701     EISSN: 19433522     Source Type: Journal    
DOI: 10.2352/J.ImagingSci.Technol.2012.56.4.040502     Document Type: Article
Times cited : (6)

References (15)
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  • 3
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    • The School of Photovoltaics and Solar Energy Engineering 2009, The University of New South Wales, Sydney
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    • New Front Metal Contact Scheme for Silicon Solar Cells
    • Rodriguez, J.1
  • 6
    • 80855132091 scopus 로고    scopus 로고
    • Effect of PECVD silicon oxynitride film composition on the surface passivation of silicon wafers
    • B. Hallam, B. Tjahjono, and S. R. Wenham, "Effect of PECVD silicon oxynitride film composition on the surface passivation of silicon wafers," Sol. Energy Mater. Sol. Cells 96, 173-179 (2010).
    • (2010) Sol. Energy Mater. Sol. Cells , vol.96 , pp. 173-179
    • Hallam, B.1    Tjahjono, B.2    Wenham, S.R.3
  • 7
    • 70350217133 scopus 로고    scopus 로고
    • Effective surface passivation of crystalline siliconby rfsputtered aluminum oxide
    • T. T. A. Li and A. Cuevas, "Effective surface passivation of crystalline siliconby rfsputtered aluminum oxide," Phys. Status Solidi (RRL) - Rapid Res. Lett. 3, 160-162 (2009).
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  • 10
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    • Series resistance caused by the localized rear contact in high efficiency silicon solar cells
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    • Zhao, J.1    Wang, A.2    Green, M.A.3
  • 11
    • 84984588173 scopus 로고    scopus 로고
    • Innovative rear point-contact scheme for silicon solar cells
    • Canberra, Australia
    • P. H. Lu, Y. Chen, and A. J. Lennon, "Innovative rear point-contact scheme for silicon solar cells," Proc. SOLA (AuSES, 2010). 2010. Canberra, Australia.
    • (2010) Proc. SOLA (AuSES, 2010)
    • Lu, P.H.1    Chen, Y.2    Lennon, A.J.3
  • 12
    • 0033364929 scopus 로고    scopus 로고
    • 24.5% efficient silicon PERT cells on MCZ substrates and 24.7% efficient PERL cells on FZ substrates
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.