Multiple internal reflection spectroscopy: A sensitive non-destructive probe for interfaces and nanometric layers

Materials Science in Semiconductor Processing

Volumn 4, Issue 1-3, 2001, Pages 15-18

  Olivier, M ^a   Rochat, N ^a   Chabli, A ^a   Lefeuvre, G ^a   Conne, F ^a  

^a CEA LETI   (France)

Author keywords

[No Author keywords available]

Indexed keywords

INTERFACES (MATERIALS); LIGHT REFLECTION; SEMICONDUCTING FILMS; SEMICONDUCTING SILICON;

MULTIPLE INTERNAL REFLECTION (MIR) INFRARED SPECTROSCOPY;

INFRARED SPECTROSCOPY;

EID: 0035246948     PISSN: 13698001     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1369-8001(00)00167-0     Document Type: Article

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