메뉴 건너뛰기




Volumn , Issue 1, 2002, Pages 240-243

Improvement of electrical properties of MOCVD grown AlxGa 1-xN/GaN heterostructure with isoelectronic Al-doped channel

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM GALLIUM NITRIDE; ALUMINUM NITRIDE; GALLIUM NITRIDE; HETEROJUNCTIONS; III-V SEMICONDUCTORS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; NITRIDES; ORGANIC CHEMICALS; ORGANOMETALLICS; SAPPHIRE; SEMICONDUCTOR ALLOYS; SEMICONDUCTOR DOPING; WIDE BAND GAP SEMICONDUCTORS;

EID: 84875085597     PISSN: 16101634     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1002/pssc.200390033     Document Type: Conference Paper
Times cited : (4)

References (9)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.