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Volumn , Issue 1, 2002, Pages 240-243
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Improvement of electrical properties of MOCVD grown AlxGa 1-xN/GaN heterostructure with isoelectronic Al-doped channel
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Author keywords
[No Author keywords available]
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Indexed keywords
ALUMINUM GALLIUM NITRIDE;
ALUMINUM NITRIDE;
GALLIUM NITRIDE;
HETEROJUNCTIONS;
III-V SEMICONDUCTORS;
METALLORGANIC CHEMICAL VAPOR DEPOSITION;
NITRIDES;
ORGANIC CHEMICALS;
ORGANOMETALLICS;
SAPPHIRE;
SEMICONDUCTOR ALLOYS;
SEMICONDUCTOR DOPING;
WIDE BAND GAP SEMICONDUCTORS;
AL INCORPORATION;
ALGAN/ALN/GAN;
ALGAN/GAN HETEROSTRUCTURES;
ALLOY DISORDER SCATTERING;
CHANNEL LAYERS;
ELECTRICAL CHARACTERISTIC;
HIGH QUALITY;
METAL ORGANIC CHEMICAL VAPOUR DEPOSITIONS;
ALUMINUM ALLOYS;
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EID: 84875085597
PISSN: 16101634
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1002/pssc.200390033 Document Type: Conference Paper |
Times cited : (4)
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References (9)
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