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Volumn 41, Issue 10, 1997, Pages 1555-1559

GaN based heterostructure for high power devices

Author keywords

[No Author keywords available]

Indexed keywords

CARRIER CONCENTRATION; COMPUTER SIMULATION; ENERGY GAP; FIELD EFFECT TRANSISTORS; HIGH TEMPERATURE OPERATIONS; MONTE CARLO METHODS; SEMICONDUCTING ALUMINUM COMPOUNDS; SEMICONDUCTING GALLIUM COMPOUNDS; SEMICONDUCTOR DOPING;

EID: 0031250249     PISSN: 00381101     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0038-1101(97)00104-4     Document Type: Article
Times cited : (80)

References (25)
  • 3
    • 5244278122 scopus 로고    scopus 로고
    • High electron mobility in two-dimensional electrons gas in AlGaN/GaN heterostructures and in bulk GaN
    • Shur, M. S., Gelmont, B. and Asif Khan, M., High Electron Mobility in Two-Dimensional Electrons Gas in AlGaN/GaN Heterostructures and in Bulk GaN, J. Electronic Materials, 1996, 25(5), 777-785.
    • (1996) J. Electronic Materials , vol.25 , Issue.5 , pp. 777-785
    • Shur, M.S.1    Gelmont, B.2    Asif Khan, M.3
  • 5
    • 0042767336 scopus 로고
    • Bristol and Philadelphia: Institute of Physics Publishing, Conference Series
    • Joshi, R. P. and Raha, P. K., Proc. 5th Conf. Silicon Carbide and Related Compounds, Bristol and Philadelphia: Institute of Physics Publishing, Conference Series Number 137, 1994, 687.
    • (1994) Proc. 5th Conf. Silicon Carbide and Related Compounds , vol.137 , pp. 687
    • Joshi, R.P.1    Raha, P.K.2
  • 15
    • 0041765446 scopus 로고
    • The fabrication of recessed gate GaN MODFET's
    • Inst. Phys. Conf. Series, No. 145: Chapter 4
    • Burm, J., Schaff, W. J. and Eastman, L. F., The fabrication of recessed gate GaN MODFET's, in Proc. 1995 Int. Symp. on Compound Semiconductors. Inst. Phys. Conf. Series, No. 145: Chapter 4, pp. 605-608 (1966).
    • (1966) Proc. 1995 Int. Symp. on Compound Semiconductors , pp. 605-608
    • Burm, J.1    Schaff, W.J.2    Eastman, L.F.3
  • 21
    • 36449006910 scopus 로고
    • Temperature activated conductance in GaN/AlGaN heterostructure field effect transistors operating at temperatures up to 300°C
    • Khan, M. A., Shur, M. S., Kuznia, J. N., Burm, J. and Schaff, W., Temperature Activated Conductance in GaN/AlGaN Heterostructure Field Effect Transistors Operating at Temperatures up to 300°C, Appl. Phys. Lett., 1995, 66(9), 1083-1085.
    • (1995) Appl. Phys. Lett. , vol.66 , Issue.9 , pp. 1083-1085
    • Khan, M.A.1    Shur, M.S.2    Kuznia, J.N.3    Burm, J.4    Schaff, W.5
  • 22
    • 0030736190 scopus 로고    scopus 로고
    • AlGaN/GaN doped channel heterostructure field effect transistors
    • Shur Michael, S., Asif Khan, M., AlGaN/GaN Doped Channel Heterostructure Field Effect Transistors, Physica Scripta., 1997, 69, 103.
    • (1997) Physica Scripta. , vol.69 , pp. 103
    • Shur Michael, S.1    Asif Khan, M.2
  • 23


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.