Lithographically patterned electrodeposition of gold, silver, and nickel nanoring arrays with widely tunable near-infrared plasmonic resonances

ACS Nano

Volumn 7, Issue 2, 2013, Pages 1755-1762

  Halpern, Aaron R ^a   Corn, Robert M ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

backside exposure; electrodeposition; nanoring; nanosphere lithography; plasmonic

Indexed keywords

ABSORPTION MAXIMA; BACKSIDE EXPOSURE; COLLOIDAL LITHOGRAPHY; COLLOIDAL MONOLAYERS; CYLINDRICAL ELECTRODES; ELECTRODE ARRAYS; ELECTRODEPOSITION PROCESS; LINEAR ANTENNAS; METAL FILM; NANO SCALE; NANO SPHERE LITHOGRAPHY; NANOHOLES; NANORING ARRAYS; NEAR INFRARED; NICKEL NANORINGS; PATTERNED ELECTRODEPOSITIONS; PLASMA ETCHING PROCESS; PLASMONIC; PLASMONIC RESONANCES; POLYMER COLLOIDS; SILVER FILM; STANDING WAVE; WIDELY TUNABLE;

ANTENNAS; ELECTRODEPOSITION; FABRICATION; GOLD; GOLD DEPOSITS; INFRARED DEVICES; METALLIC FILMS; MONOLAYERS; NANOSTRUCTURED MATERIALS; NANOTECHNOLOGY; NICKEL; PHOTORESISTS; PLASMA ETCHING; PLASMONS; PROCESS CONTROL; RESONANCE; SCANNING ELECTRON MICROSCOPY; SILVER; VAPORS;

NANORINGS;

EID: 84874427738     PISSN: 19360851     EISSN: 1936086X     Source Type: Journal    
DOI: 10.1021/nn3058505     Document Type: Article

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