Extending nanosphere lithography for the fabrication of periodic arrays of subwavelength metallic nanoholes

Materials Letters

Volumn 63, Issue 28, 2009, Pages 2520-2522

  Canpean, V ^a   Astilean, S ^a  

^a Faculty of Physics   (Romania)

Author keywords

Deposition; Metallic hole array; Nanomaterials; Nanosphere lithography; Reactive ion etching; Surface plasmons

Indexed keywords

DIFFERENT SIZES; METAL DEPOSITION; METALLIC HOLE ARRAY; METALLIC NANOHOLE ARRAYS; NANOHOLES; NANOMATERIALS; NANOSPHERE LITHOGRAPHY; OPTICAL RESPONSE; ORDERED ARRAY; PERIODIC ARRAYS; SELF ASSEMBLED FILMS; SUB-WAVELENGTH; SURFACE PLASMONS; TRIANGULAR ARRAYS;

FABRICATION; IONS; LITHOGRAPHY; NANOSPHERES; NANOSTRUCTURED MATERIALS; PLASMONS; POLYSTYRENES;

REACTIVE ION ETCHING;

EID: 70349243043     PISSN: 0167577X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matlet.2009.08.056     Document Type: Article

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