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Volumn 17, Issue 24, 1998, Pages 2097-2100

Intrinsic hydrogenated microcrystalline silicon oxide films prepared by RF glow discharge

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION SPECTROSCOPY; CHEMICAL BONDS; CRYSTAL GROWTH; CRYSTAL STRUCTURE; CRYSTALLINE MATERIALS; DENSITY (OPTICAL); DEPOSITION; FILM PREPARATION; GLOW DISCHARGES; HYDROGENATION; LIGHT ABSORPTION; SILICON COMPOUNDS;

EID: 0032260317     PISSN: 02618028     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1006688218232     Document Type: Article
Times cited : (9)

References (14)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.