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Volumn 17, Issue 24, 1998, Pages 2097-2100
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Intrinsic hydrogenated microcrystalline silicon oxide films prepared by RF glow discharge
a a a |
Author keywords
[No Author keywords available]
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Indexed keywords
ABSORPTION SPECTROSCOPY;
CHEMICAL BONDS;
CRYSTAL GROWTH;
CRYSTAL STRUCTURE;
CRYSTALLINE MATERIALS;
DENSITY (OPTICAL);
DEPOSITION;
FILM PREPARATION;
GLOW DISCHARGES;
HYDROGENATION;
LIGHT ABSORPTION;
SILICON COMPOUNDS;
MICROCRYSTALLINE SILICON OXIDE;
CONDUCTIVE FILMS;
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EID: 0032260317
PISSN: 02618028
EISSN: None
Source Type: Journal
DOI: 10.1023/A:1006688218232 Document Type: Article |
Times cited : (9)
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References (14)
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