Synthesis and growth mechanism of SiC/SiO2 nanochains heterostructure by catalyst-free chemical vapor deposition

Journal of the American Ceramic Society

Volumn 96, Issue 2, 2013, Pages 627-633

  Wei, Jian ^a,b   Li, Kezhi ^c   Chen, Jin ^a   Yuan, Hudie ^a   He, Geping ^a   Yang, Chunli ^a  

^a XI'AN UNIVERSITY OF ARCHITECTURE AND TECHNOLOGY   (China)

^b SOUTHEAST UNIVERSITY   (China)

^c NORTHWESTERN POLYTECHNICAL UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS LAYER; AMORPHOUS SILICA; CATALYST-FREE; CHEMICAL VAPOR DEPOSITION PROCESS; DOUBLE LAYERS; GROWTH MECHANISMS; NANOCHAINS; RAYLEIGH INSTABILITY; SIC NANOWIRE; SIC/SIO; SILICA DEPOSITION; SILICA MELT; SURFACE PRESSURES; VAPOR SOLID MECHANISM;

CATALYSTS; CHEMICAL VAPOR DEPOSITION; NANOWIRES; SILICA; SILICON CARBIDE;

VAPORS;

EID: 84873739164     PISSN: 00027820     EISSN: 15512916     Source Type: Journal    
DOI: 10.1111/jace.12005     Document Type: Article

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