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Volumn 33, Issue , 2013, Pages 54-62

Tribological properties and cutting performance of boron and silicon doped diamond films on Co-cemented tungsten carbide inserts

Author keywords

Boron; Cutting performance; Doped diamond; Silicon; Tribological

Indexed keywords

ADHESIVE STRENGTH; AMBIENT AIR; B-DOPED DIAMOND FILMS; BORON-DOPED; BORON-DOPING; CEMENTED TUNGSTEN CARBIDES; CUTTING PERFORMANCE; CUTTING TEST; DIAMOND GRAINS; DOPED DIAMONDS; DOPED-DIAMOND FILMS; FRICTION COEFFICIENTS; FRICTION TEST; GRAIN SIZE; HIGH-SILICON ALUMINUM ALLOY; HOT-FILAMENT CHEMICAL VAPOR DEPOSITION; HYDROGEN GAS; SILICON NITRIDE CERAMICS; SOURCE MATERIAL; TRIBOLOGICAL; TRIBOLOGICAL PROPERTIES; TRIBOMETERS; TRIMETHYL BORATES; WEAR RATES; WORKPIECE;

EID: 84873677088     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2013.01.004     Document Type: Article
Times cited : (79)

References (23)
  • 22
    • 27744504853 scopus 로고    scopus 로고
    • Akira Fujishima, Yasuaki Einaga, Tate Narasinga Rao, Donald A. Tryk, Elsevier B.V Amsterdam
    • C. Lévy-Clément Akira Fujishima, Yasuaki Einaga, Tate Narasinga Rao, Donald A. Tryk, Diamond Electrochemistry 2005 Elsevier B.V Amsterdam 80 114
    • (2005) Diamond Electrochemistry , pp. 80-114
    • Lévy-Clément, C.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.