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Volumn 18, Issue 2-3, 2009, Pages 238-243
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Deposition and friction properties of ultra-smooth composite diamond films on Co-cemented tungsten carbide substrates
a
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Author keywords
Friction property; HFCVD; Ultra smooth composite diamond (USCD) film; WC Co substrate
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Indexed keywords
ALUMINA;
ATOMIC SPECTROSCOPY;
CHEMICAL VAPOR DEPOSITION;
COBALT;
COMPOSITE FILMS;
COPPER;
DIAMOND CUTTING TOOLS;
DIAMONDS;
ELECTRODEPOSITION;
FRICTION;
MICROSCOPES;
SCANNING ELECTRON MICROSCOPY;
SUBSTRATES;
TRIBOLOGY;
TUNGSTEN;
TUNGSTEN ALLOYS;
TUNGSTEN CARBIDE;
X RAY ANALYSIS;
ALUMINA CERAMICS;
ATOMIC FORCE MICROSCOPES;
BALL-BEARING STEELS;
CEMENTED TUNGSTEN CARBIDES;
CHEMICAL VAPORS;
COATED TOOLS;
DEPOSITION METHODS;
DRY SLIDING;
FRICTION COEFFICIENTS;
FRICTION PROPERTY;
FRICTION TESTS;
HFCVD;
HIGH QUALITIES;
HOT FILAMENTS;
INDENTATION TESTS;
LOW FRICTION COEFFICIENTS;
MICROCRYSTALLINE DIAMONDS;
NANOCRYSTALLINE DIAMONDS;
PLATE TYPES;
POLISHING TECHNIQUES;
RAMAN SPECTRUM;
RECIPROCATING FRICTIONS;
ROCKWELL;
SCANNING ELECTRON MICROSCOPES;
SURFACE PROFILOMETER;
ULTRA-SMOOTH COMPOSITE DIAMOND (USCD) FILM;
WATER LUBRICATING;
WC-CO SUBSTRATE;
X-RAY DIFFRACTIONS;
DIAMOND FILMS;
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EID: 59649109955
PISSN: 09259635
EISSN: None
Source Type: Journal
DOI: 10.1016/j.diamond.2008.10.053 Document Type: Article |
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Times cited : (118)
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References (19)
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