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Volumn 23, Issue 7, 2013, Pages 870-877

Colloidal occlusion template method for micromanufacturing of omniphobic surfaces

Author keywords

colloidal lithography; liquid repellency; omniphobic; reentrant geometry; template synthesis

Indexed keywords

CASSIE STATE; COLLOIDAL LITHOGRAPHY; COLLOIDAL MONOLAYERS; EFFICIENT STRATEGY; ELECTROCHEMICAL GROWTH; HEXADECANE; HIGH ASPECT RATIO; LIQUID REPELLENCY; METAL NANOWIRE; MICRO-MANUFACTURING; NANO-POROUS; NON-WETTING; OLEOPHOBICITY; OMNIPHOBIC; ORDERS OF MAGNITUDE; SACRIFICIAL TEMPLATES; SELF-ASSEMBLED; SUPERHYDROPHOBIC BEHAVIOR; SURFACE DENSITY; TEMPLATE METHODS; TEMPLATE SYNTHESIS;

EID: 84873657462     PISSN: 1616301X     EISSN: 16163028     Source Type: Journal    
DOI: 10.1002/adfm.201201575     Document Type: Article
Times cited : (23)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.