Wafer-level patterned and aligned polymer nanowire/ micro- and nanotube arrays on any substrate

Advanced Materials

Volumn 21, Issue 20, 2009, Pages 2072-2076

  Morber, Jenny Ruth ^a   Wang, Xudong ^a   Liu, Jin ^a   Snyder, Robert L ^a   Wang, Zhong Lin ^a  

^a Georgia Institute of Technology   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DENSE PLASMA; MATERIAL DEGRADATION; NANOTUBE ARRAYS; PHYSICAL COMPONENTS; POLYMER MATERIALS; POLYMER NANOWIRES; POWER SOURCES; REACTIVE ION; WAFER LEVEL;

ARGON; INDUCTIVELY COUPLED PLASMA; IONS; NANOTUBES; NANOWIRES; ORGANIC POLYMERS; PLASMA ETCHING; POLYMERS;

REACTIVE ION ETCHING;

EID: 66249147252     PISSN: 09359648     EISSN: None     Source Type: Journal    
DOI: 10.1002/adma.200803648     Document Type: Article

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